DFM.bib

% ===================================================
%             DFM Summary
% ===================================================
%{{{
@misc{ITRS,
    title        = {{ITRS}},
    howpublished = "\url{http://www.itrs.net}",
}
@misc{KLAYOUT,
    title        = {{KLAYOUT}},
    howpublished = "\url{https://www.klayout.de}",
}
@misc{DFM-USP2014-Robles,
    title  = {Integrated circuit layout design methodology with process variation bands},
    author = {Robles, Juan Andres Torres},
    year   = {2014},
    month  = aug # "~5",
    note   = {{US Patent 8,799,830}}
}
@inproceedings{DFM-SPIE1995-Moore,
    author    = {Moore, Gordon E.},
    title     = {Lithography and the future of {Moore}'s law},
    booktitle = spie,
    volume    = {2438},
    pages     = {2--17},
    year      = {1995},
}
@book{DFM-B2001-Wong,
    title     = {{Resolution Enhancement Techniques in Optical Lithography}},
    author    = {Wong, Alfred Kwok-Kit},
    volume    = {47},
    year      = {2001},
    publisher = {SPIE press},
}
@article{DFM-JM3-2002-Lin,
    title   = {The k3 coefficient in nonparaxial $\lambda$/NA scaling equations for resolution, depth of focus, and immersion lithography},
    author  = {Lin, Burn J.},
    journal = jm3,
    volume  = {1},
    number  = {1},
    pages   = {7--12},
    year    = {2002},
}
@book{DFM-B2004-John,
    title     = {{Field Guide to Geometrical Optics}},
    author    = {Greivenkamp, John E.},
    year      = {2004},
    publisher = {SPIE Press Bellingham, WA},
}
@book{DFM-B2006-Mack,
    title     = {{Field Guide to Optical Lithography}},
    author    = {Mack, Chris A.},
    volume    = {6},
    year      = {2006},
    publisher = {SPIE Press Bellingham},
}
@book{DFM-B2007-Michael,
    title     = {{Design for Manufacturability and Statistical Design: A Constructive Approach}},
    author    = {Orshansky, Michael and Nassif, Sani and Boning, Duane},
    year      = {2007},
    publisher = {Springer Science \& Business Media},
}
@inproceedings{DFM-ASPDAC2007-Chen,
    title     = {{DFM/DFY} practices during physical designs for timing, signal integrity, and power},
    author    = {Chen, Shi-Hao and Chu, Ke-Cheng and Lin, Jiing-Yuan and Tsai, Cheng-Hong},
    booktitle = aspdac,
    pages     = {232--237},
    year      = {2007},
}
@book{DFM-B2008-Mack,
    title     = {{Fundamental Principles of Optical Lithography: The Science of Microfabrication}},
    author    = {Mack, Chris},
    year      = {2008},
    publisher = {John Wiley \& Sons},
}
@article{DFM-JM3-2008-Lin,
    title    = {Successors of {ArF} water-immersion lithography: {EUV} lithography, multi-e-beam maskless lithography, or nanoimprint?},
    author   = {Lin, Burn J},
    journal  = jm3,
    volume   = {7},
    number   = {4},
    pages    = {040101--040101},
    year     = {2008},
}
@inproceedings{DFM-2009-Borodovsky,
    title     = {Lithography 2009 Overview of Opportunities},
    author    = {Y. Borodovsky},
    booktitle = {Semicon West},
    year      = {2009},
}
@inproceedings{DFM-2010-Borodovsky,
    title     = {{MPProcessing for MPProcessors}},
    author    = {Y. Borodovsky},
    booktitle = {Maskless Lithography and Multibeam Mask Writer Workshop},
    year      = {2010},
}
@inproceedings{DFM-SPIE2008-Kahng,
    title     = {Lithography and design in partnership: a new roadmap},
    author    = {Kahng, Andrew B},
    booktitle = spie,
    volume    = {7122},
    year      = {2008},
}
@inproceedings{DFM-DAC2009-Strojwas,
    author    = {Strojwas, A. J. and Jhaveri, T. and Rovner, V. and Pileggi, L.},
    title     = {Creating an affordable 22nm node using design-lithography co-optimization},
    booktitle = dac,
    pages     = {95--96},
    year      = {2009},
}
@article{DFM-SIGDA2010-Gupta,
    title     = {What is process window?},
    author    = {Gupta, Puneet},
    journal   = {ACM SIGDA Newsletter},
    volume    = {40},
    number    = {8},
    pages     = {1--1},
    year      = {2010},
    publisher = {ACM},
}
@inproceedings{DFM-SPIE2011-Levinson,
    title     = {{Principles of Lithography}},
    author    = {Levinson, H.J.},
    booktitle = spie,
    pages     = {261--263},
}
@inproceedings{DFM-ISPD2012-Lin,
    title     = {Lithography till the end of {Moore}'s law},
    author    = {Lin, Burn J.},
    pages     = {1--2},
    booktitle = ispd,
    year      = {2012},
} 
@inproceedings{DFM-ICCAD2012-Yu,
    title     = {Dealing with {IC} manufacturability in extreme scaling},
    author    = {Yu, Bei and Gao, Jhih-Rong and Ding, Duo and Ban, Yongchan and Yang, Jae-Seok and Yuan, Kun and Cho, Minsik and Pan, David Z.},
    booktitle = iccad,
    pages     = {240--242},
    year      = {2012},
}
@inproceedings{DFM-ISQED2012-Capodieci,
    title     = {Beyond 28nm: New Frontiers and Innovations in Design For Manufacturability at the Limits of the Scaling Roadmap},
    author    = {Luigi Capodieci},
    booktitle = isqed,
    year      = {2012},
}
@inproceedings{DFM-2013-Borodovsky,
    title     = {Lithography Options for Future Logic {ICs}},
    author    = {Yan Borodovsky},
    booktitle = {15th Leti Annual Review},
    year      = {2013},
}
@article{DFM-MDAT2013-Liebmann, 
    title    = {A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node {[Tutorial]}}, 
    author   = {Liebmann, L. and Torres, J.A.}, 
    journal  = mdat, 
    year     = {2013}, 
    month    = {June}, 
    volume   = {30}, 
    number   = {3}, 
    pages    = {70--92}, 
}
@article{DFM-TCAD2013-Pan,
    title    = {Design for Manufacturing With Emerging Nanolithography},
    author   = {David Z.~Pan and Yu, Bei and Gao, J.-R.},
    journal  = tcad,
    volume   = {32},
    number   = {10},
    pages    = {1453--1472},
    year     = {2013},
}
@inproceedings{DFM-SPIE2014-Yu,
    title     = {Bridging the gap from mask to physical design for multiple patterning lithography},
    author    = {Bei Yu and Jhih-Rong Gao and Xiaoqing Xu and David Z.~Pan},
    booktitle = spie,
    volume    = 9053,
    year      = {2014},
}
@inproceedings{DFM-SPIE2014-Liebmann,
    title     = {Demonstrating production quality multiple exposure patterning aware routing for the 10nm node},
    author    = {Liebmann, Lars and Gerousis, Vassilios and Gutwin, Paul and Zhang, Mike and Han, Geng and Cline, Brian},
    booktitle = spie,
    volume    = 9053,
    year      = {2014},
    abstract  = {DPL has been utilized in 14nm, SADP challenges for 10nm}
}
@inproceedings{DFM-ICCAD2014-Hsu,
    title     = {Design and manufacturing process co-optimization in nano-technology},
    author    = {Hsu, Meng-Kai and Katta, Nitesh and Lin, Homer Yen-Hung and Lin, Keny Tzu-Hen and Tam, King Ho and Wang, Ken Chung-Hsing},
    booktitle = iccad,
    pages     = {574--581},
    year      = {2014},
    abstract  = {capacitance and resistance NUMBER across all layers; },
}
@inproceedings{DFM-SPIE2015-Lin,
    title     = {Optical lithography with and without {NGL} for single-digit nanometer nodes},
    author    = {Lin, Burn J},
    booktitle = spie,
    volume    = 9426,
    year      = {2015},
}
@inproceedings{DFM-SPIE2015-Mallik,
    title     = {Maintaining {Moore}'s law - Enabling Cost-friendly Dimensional Scaling},
    author    = {Arindam Mallik and Julien Ryckaert and Abdelkarim Mercha and Diederik Verkest and Kurt Ronse and Aaron Thean},
    booktitle = spie,
    volume    = {9422},
    year      = {2015},
}
@book{DFM-B2015-Yu,
    title     = {{Design for Manufacturability with Advanced Lithography}},
    author    = {Yu, Bei and David Z.~Pan},
    year      = {2015},
    publisher = {Springer},
}
@article{DFM-SCIS2016-Yu,
    title     = {Design for manufacturability and reliability in extreme-scaling {VLSI}},
    author    = {Yu, Bei and Xu, Xiaoqing and Roy, Subhendu and Lin, Yibo and Ou, Jiaojiao and Pan, David Z.},
    journal   = scis,
    pages     = {1--23},
    year      = {2016},
    publisher = {Springer},
}
% ==== DFM dissertation
@phdthesis{DFM-PHD2012-Zhang,
    title  = {Design-technology co-optimization in next generation lithography},
    author = {Zhang, Hongbo},
    year   = {2012},
    school = {University of Illinois at Urbana-Champaign},
}
%}}}
% ==== summary GDR
%{{{
@inproceedings{GDR-SPIE2009-Liebmann,
    title     = {Simplify to survive: prescriptive layouts ensure profitable scaling to 32nm and beyond},
    author    = {Liebmann, Lars and Pileggi, Larry and Hibbeler, Jason and Rovner, Vyacheslav and Jhaveri, Tejas and Northrop, Greg},
    booktitle = spie,
    volume    = 7275,
    year      = {2009},
}
@inproceedings{GDR-SPIE2013-Smayling,
    title     = {{1D} design style implications for mask making and {CEBL}},
    author    = {Smayling, Michael C.},
    booktitle = spie,
    volume    = 8880,
    year      = {2013},
}
@inproceedings{DFM-SPIE2014-Axelrad,
    title     = {Characterization of {1D} layout technology at advanced nodes and low k1},
    author    = {Axelrad, V. and Mikami, K. and Smayling, M. and Tsujita, K. and Yaegashi, H.},
    booktitle = spie-al,
    volume    = {9052},
    year      = {2014},
    abstract  = {MEEF value can be 10 for End-End point},
}
@inproceedings{DFM-SPIE2014-Axelrad2,
    title     = {{OPC}-lite for gridded designs at low k1},
    author    = {Axelrad, V. and Smayling, M. and Tsujita, K. and Mikami, K. and Yaegashi, H.},
    booktitle = spie-pt,
    volume    = {9235},
    year      = {2014},
}
@inproceedings{DFM-SPIE2015-Ryckaert,
    title     = {{DTCO at N7} and beyond: patterning and electrical compromises and opportunities},
    author    = {Ryckaert, Julien and Raghavan, Praveen and Schuddinck, Pieter and Trong, Huynh Bao and Mallik, Arindam and Sakhare, Sushil S. and Chava, Bharani and Sherazi, Yasser and Leray, Philippe and Mercha, Abdelkarim and others},
    booktitle = spie,
    volume    = 9427,
    year      = {2015},
}
@inproceedings{DFM-SPIE2015-Liebmann,
    title    =  {The daunting complexity of scaling to 7nm without {EUV}: Pushing {DTCO} to the extreme},
    author   =  {Lars Liebmann and Albert Chu and Paul Gutwin},
    booktitle=  spie,
    volume   =  9427,
    year     =  {2015},
}
@inproceedings{DFM-SPIE2015-Gillijns,
    title     = {Impact of a {SADP} flow on the design and process for {N10/N7} metal layers},
    author    = {Gillijns, W. and Sherazi, S.M.Y. and Trivkovic, D. and Chava, B. and Vandewalle, B. and Gerousis, V. and Raghavan, P. and Ryckaert, J. and Mercha, K. and Verkest, D. and others},
    booktitle = spie,
    volume    = 9427,
    year      = {2015},
}
@inproceedings{DFM-SPIE2015-Xu,
    title       = {Design layout analysis and DFM optimization using topological patterns},
    author      = {Xu, Ji and Krishnamoorthy, Karthik N and Teoh, Edward and Dai, Vito and Capodieci, Luigi and Sweis, Jason and Lai, Ya-Chieh},
    booktitle   = spie,
    volume      = {9427},
    year        = {2015},
}
%}}}


% ===================================================
%                 DFM aware Routing
% ===================================================
% ==== GDR aware route
%{{{
@inproceedings{DFMR-SPIE2012-Huang,
    title     = {Local loops for robust inter-layer routing at sub-20 nm nodes},
    author    = {Huang, Wenbin and Morris, Daniel and Lafferty, Neal and Liebmann, Lars and Vaidyanathan, Kaushik and Lai, Kafai and Pileggi, Larry and Strojwas, Andrzej J.},
    booktitle = spie-al,
    volume    = {8327},
    year      = {2012},
}
@inproceedings{DFMR-DAC2015-Su,
    title     = {Nanowire-aware routing considering high cut mask complexity},
    author    = {Su, Yu-Hsuan and Chang, Yao-Wen},
    booktitle = dac,
    pages     = {138:1--138:6},
    year      = {2015},
}
@inproceedings{DFMR-DAC2015-Han,
    title     = {Evaluation of {BEOL} Design Rule Impacts Using an Optimal {ILP}-based Detailed Router},
    author    = {Han, Kwangsoo and Kahng, Andrew B. and Lee, Hyein},
    booktitle = dac,
    year      = {2015},
    pages     = {68:1--68:6},
}
@inproceedings{DFMR-DAC2015-Xu,
    title     = {{PARR}: Pin Access Planning and Regular Routing for Self-Aligned Double Patterning},
    author    = {Xiaoqing Xu and Bei Yu and Jhih-Rong Gao and Che-Lun Hsu and David Z.~Pan},
    booktitle = dac,
    pages     = {28:1--28:6},
    year      = {2015},
}
@article{DFMR-TODAES2016-Xu,
    title   = {{PARR}: Pin-Access Planning and Regular Routing for Self-Aligned Double Patterning},
    author  = {Xu, Xiaoqing and Yu, Bei and Gao, Jhih-Rong and Hsu, Che-Lun and Pan, David Z.},
    journal = todaes,
    volume  = {21},
    number  = {3},
    month   = may,
    year    = {2016},
    pages   = {42:1--42:21},
}
@article{DFMR-TCAD2017-Xu,
    title={Redundant Local-Loop Insertion for Unidirectional Routing},
    author={Xu, Xiaoqing and Lin, Yibo and Li, Meng and Ou, Jiaojiao and Cline, Brian and Pan, David Z.},
    journal=tcad,
    volume={36}, 
    number={7}, 
    pages={1113-1125}, 
    year={2017},
    publisher={IEEE},
}
%}}}
% ==== DSA aware routing
%{{{
@inproceedings{DFMR-SPIE2014-Du,
    title     = {{DSA}-Aware Detailed Routing for Via Layer Optimization},
    author    = {Yuelin Du and Zigang Xiao and Martin D.~F.~Wong and He Yi and H.-S.~Philip Wong},
    booktitle = spie,
    volume    = {9049},
    year      = {2014},
}
@inproceedings{DFMR-ICCAD2016-Su,
    title     = {{VCR}: simultaneous via-template and cut-template-aware routing for directed self-assembly technology},
    author    = {Su, Yu-Hsuan and Chang, Yao-Wen},
    booktitle = iccad,
    pages     = {49},
    year      = {2016},
}
@inproceedings{DFMR-ISPD2017-Ou,
    title     = {{DSAR: DSA} Aware Routing with Simultaneous {DSA} Guiding Pattern and Double Patterning Assignment},
    author    = {Ou, Jiaojiao and Yu, Bei and Xu, Xiaoqing and Mitra, Joydeep and Lin, Yibo and Pan, David Z.},
    booktitle = ispd,
    pages     = {91--98},
    year      = {2017},
} 
%}}}
% ==== EBL aware routing
%{{{
@inproceedings{DFMR-DAC2013-Fang,
    title     = {Stitch-aware routing for multiple e-beam lithography},
    author    = {Fang, Shao-Yun and Liu, Iou-Jen and Chang, Yao-Wen},
    booktitle = dac,
    pages     = {25:1--25:6},
    year      = {2013},
}
@inproceedings{DFMR-ISPD2013-Ikeno,
    title     = {A structured routing architecture and its design methodology suitable for high-throughput electron beam direct writing with character projection},
    author    = {Ikeno, Rimon and Maruyama, Takashi and Komatsu, Satoshi and Iizuka, Tetsuya and Ikeda, Makoto and Asada, Kunihiro},
    booktitle = ispd,
    pages     = {69--76},
    year      = {2013},
}
@article{DFMR-IEICE2013-Ikeno,
    title   = {High-Throughput Electron Beam Direct Writing of {VIA} Layers by Character Projection with One-Dimensional {VIA} Characters},
    author  = {IKENO, Rimon and MARUYAMA, Takashi and KOMATSU, Satoshi and IIZUKA, Tetsuya and IKEDA, Makoto and ASADA, Kunihiro},
    journal = ieice,
    volume  = {96},
    number  = {12},
    pages   = {2458--2466},
    year    = {2013},
}
%}}}
% ==== DPL aware routing
%{{{
@inproceedings{DFMR-ICCAD2008-Cho,
    title     = {Double patterning technology friendly detailed routing},
    author    = {Cho, Minsik and Ban, Yongchan and David Z.~Pan},
    booktitle = iccad,
    pages     = {506--511},
    year      = {2008},
}
@inproceedings{DFMR-DAC2009-Yuan,
    title     = {Double Patterning Lithography Friendly Detailed Routing with Redundant Via Consideration},
    author    = {Kun Yuan and Katrina Lu and David Z.~Pan},
    booktitle = dac,
    pages     = {63--66},
    year      = {2009},
}
@inproceedings{DFMR-SPIE2010-Yang,
    title     = {{DRCPlus} in a router: automatic elimination of lithography hotspots using {2D} pattern detection and correction},
    author    = {Yang, Jie and Rodriguez, Norma and Omedes, Olivier and Gennari, Frank and Lai, Ya-Chieh and Mankad, Viral},
    booktitle = spie,
    volume    = 7641,
    year      = {2010},
}
@inproceedings{DFMR-DAC2010-Lin,
    title     = {Double patterning lithography aware gridless detailed routing with innovative conflict graph},
    author     = {Yen-Hung Lin and Yih-Lang Li},
    booktitle = dac,
    pages     = {398--403},
    year      = {2010},
}
@inproceedings{DFMR-ICCAD2011-Lin,
    title     = {{DOPPLER}: {DPL}-aware and {OPC}-friendly Gridless Detailed Routing with Mask Density Balancing}, 
    author    = {Yen-Hung Lin and Yong-Chan Ban and David Z.~Pan and Yih-Lang Li},
    booktitle = iccad,
    pages     = {283--289},
    year      = {2011},
}
@inproceedings{DFMR-ASPDAC2011-Sun,
    title     = {Post-routing layer assignment for double patterning},
    AUTHOR    = {Jian Sun and Yinghai Lu and Hai Zhou and Xuan Zeng},
    booktitle = aspdac,
    PAGES     = {793--798},
    year      = {2011}, 
    location  = {Yokohama, Japan},
    abstract  = {Novelty: proof that DPL layout decomposition with stitch and conflict minimization is NP-complete.},
}
%}}}
% ==== SADP aware routing
%{{{
@inproceedings{DFMR-SPIE2011-Mirsaeedi,
    title     = {Self-aligned double-patterning {(SADP)} friendly detailed routing},
    author    = {Mirsaeedi, Minoo and Torres, J. Andres and Anis, Mohab},
    Booktitle = spie,
    volume    = {7974},
    year      = {2011},
}
@inproceedings{DFMR-ISPD2012-Gao,
    AUTHOR    = {Jhih-Rong Gao and David Z.~Pan},
    title     = {Flexible Self-aligned Double Patterning Aware Detailed Routing with Prescribed Layout Planning},
    booktitle = ispd,
    pages     = {25--32},
    year      = {2012},
}
@inproceedings{DFMR-ASPDAC2013-Kodama,
    title     = {Self-Aligned Double and Quadruple Patterning-Aware Grid Routing with Hotspots Control},
    AUTHOR    = {Chikaaki Kodama and Hirotaka Ichikawa and Koichi Nakayama and Toshiya Kotani and Shigeki Nojima and Shoji Mimotogi and Shinji Miyamoto and Atsushi Takahashi},
    booktitle = aspdac,
    pages     = {267--272},
    year      = {2013},
}
@inproceedings{DFMR-SPIE2013-Gao,
    title     = {Self-aligned double patterning compliant routing with in-design physical verification flow},
    author    = {Gao, Jhih-Rong and Jawandha, Harshdeep and Atkar, Prasad and Walimbe, Atul and Baidya, Bikram and Rizzo, Olivier and David Z.~Pan},
    booktitle = spie,
    volume    = 8684,
    year      = {2013},
}
@inproceedings{DFMR-DAC2013-Du,
    title     = {Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography},
    author    = {Du, Yuelin and Ma, Qiang and Song, Hua and Shiely, James and Luk-Pat, Gerard and Miloslavsky, Alexander and Martin D.~F.~Wong},
    booktitle = dac,
    pages     = {93:1--93:6},
    year      = {2013},
}
@inproceedings{DFMR-SPIE2013-Nakajima,
    title     ={Detailed routing with advanced flexibility and in compliance with self-aligned double patterning constraints},
    author    ={Nakajima, Fumiharu and Kodama, Chikaaki and Ichikawa, Hirotaka and Nakayama, Koichi and Nojima, Shigeki and Kotani, Toshiya and Mimotogi, Shoji and Miyamoto, Shinji},
    booktitle =spie,
    volume    =8684,
    year      ={2013},
}
@inproceedings{DFMR-DAC2014-Liu,
    title     = {Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process},
    author    = {Liu, Iou-Jen and Fang, Shao-Yun and Chang, Yao-Wen},
    booktitle = dac,
    pages     = {50:1--50:6},
    year      = {2014},
}
@inproceedings{DFMR-ASPDAC2015-Fang,
    title     = {Cut mask optimization with wire planning in self-aligned multiple patterning full-chip routing},
    author    = {Fang, Shao-Yun},
    booktitle = aspdac,
    pages     = {396--401},
    year      = {2015},
}
@inproceedings{DFMR-DAC2015-Ding,
    title     = {Detailed routing for spacer-is-metal type self-aligned double/quadruple patterning lithography},
    author    = {Ding, Yixiao and Chu, Chris and Mak, Wai-Kei},
    booktitle = dac,
    pages     = {69:1--69:6},
    year      = {2015},
}
%}}}
% ==== TPL aware routing
%{{{
@inproceedings{DFMR-DAC2012-Ma,
    title      = {Triple patterning aware routing and its comparison with double patterning aware routing in 14nm technology},
    author     = {Ma, Qiang and Zhang, Hongbo and Martin D.~F.~Wong},
    booktitle  = dac,
    pages      = {591--596},
    year       = {2012},
    location   = {San Francisco, California},
}
@inproceedings{DFMR-ICCAD2012-Lin,
    title     = {{TRIAD}: A Triple Patterning Lithography Aware Detailed Router},
    author    = {Yen-Hung Lin and Bei Yu and David Z.~Pan and Yih-Lang Li},
    booktitle = iccad,
    pages     = {123--129},
    year      = {2012},
    location  = {San Jose, California},
}
@inproceedings{DFMR-ASPDAC2015-Hsu,
    title     = {Non-stitch triple patterning-aware routing based on conflict graph pre-coloring},
    author    = {Hsu, Po-Ya and Chang, Yao-Wen},
    booktitle = aspdac,
    pages     = {390--395},
    year      = {2015},
}
@inproceedings{DFMR-DATE2015-Liu,
    title     = {An effective triple patterning aware grid-based detailed routing approach},
    author    = {Liu, Zhiqing and Liu, Chuangwen and Evangeline F.~Y.~Young},
    booktitle = date,
    pages     = {1641--1646},
    year      = {2015},
}
%}}}
% ==== general lithography aware routing
%{{{
@inproceedings{DFMR-DAC2004-Huang,
    title     = {Optical Proximity Correction ({OPC}): Friendly Maze Routing},
    author    = {L.-D.~Huang and M.~D.~F.~Wong},
    booktitle = dac,
    pages     = {186--191},
    year      = {2004},
}
@inproceedings{DFMR-DAC2005-Wu,
    title     = {Maze Routing with {OPC} Consideration},
    author    = {Y.-R.~Wu and M.-C.~Tsai and T.-C.~Wang},
    booktitle = dac,
    pages     = {186--191},
    year      = {2005},
}
@inproceedings{DFMR-DAC2005-Mitra,
    title     = {{RADAR: RET}-aware detailed routing using fast lithography simulations},
    author    = {Joydeep Mitra and Peng Yu and David Z.~Pan},
    booktitle = dac,
    pages     = {369--372},
    year      = {2005},
}
@inproceedings{DFMR-ICCAD2006-Cho,
    title     = {Wire Density Driven Global Routing for {CMP} Variation and Timing},
    author    = {M. Cho and H. Xiang and R. Puri and D. Z. Pan},
    booktitle = iccad,
    pages     = {487--492},
    year      = {2006},
}
@article{DFMR-TCAD2007-Li,
    title   = {Multilevel full-chip routing with testability and yield enhancement},
    author  = {Shu-Min Li, K and Chang, Yao-Wen and Lee, Chung-Len and Su, Chauchin and Chen, Jwu E},
    journal = tcad,
    volume  = {26},
    number  = {9},
    pages   = {1625--1636},
    year    = {2007},
}
@article{DFMR-TCAD2009-Cho,
    title   = {{ELIAD}: Efficient Lithography Aware Detailed Routing Algorithm with Compact and Macro Post-{OPC} Printability Prediction},
    author  = {M.~Cho and K.~Yuan and Y.~Ban and David Z.~Pan},
    journal = tcad,
    volume  = {28},
    number  = {7},
    pages   = {1006--1016},
    year    = {2009},
}
@article{DFMR-TCAD2009-Chen,
    title   = {A Novel Wire-Density-Driven Full-Chip Routing System for {CMP} Variation Control},
    author  = {Huang-Yu Chen and Szu-Jui Chou and Sheng-Lung Wang and Y.-W. Chang},
    journal = tcad,
    year    = {2009},
    volume  = {28},
    number  = {2},
    pages   = {193--206},
}
@article{DFMR-TCAD2010-Chen,
    title   = {Predictive Formulae for {OPC} with Applications to Lithography-Friendly Routing},
    author  = {T.-C.~Chen and G.-W.~Liao and Y.-W.~Chang},
    journal = tcad,
    volume  = {29},
    number  = {1},
    pages   = {40--50},
    year    = {2010},
}
@article{DFMR-TVLSI2010-Shen,
    title    = {{ECP}- and {CMP}-aware detailed routing algorithm for {DFM}},
    author   = {Y. Shen and Q. Zhou and Y. Cai and X. Hong},
    journal  = tvlsi,
    volume   = {18},
    number   = {1},
    pages    = {153--157},
    year     = {2010},
}
@inproceedings{DFMR-DAC2011-Ding,
    title     = {{AENEID}: a generic lithography-friendly detailed router based on post-{RET} data learning and hotspot detection},
    author    = {Duo Ding and Jhih-Rong Gao and Kun Yuan and David Z.~Pan},
    booktitle = dac,
    pages     = {795--800},
    year      = {2011},
}
@inproceedings{DFMR-ISPD2013-Fang,
    title     = {Simultaneous {OPC-} and {CMP-}aware routing based on accurate closed-form modeling},
    author    = {S.-Y.~Fang and C.-W.~Lin and G.-W.~Liao and Y.-W.~Chang},
    booktitle = ispd,
    year      = {2013},
    pages     = {77--84},
} 
%}}}


% ===================================================
%               DFM aware Placement
% ===================================================
%{{{
% ==== general litho aware placement
%{{{
@article{DFMP-TCAD2008-Chen,
    title   = {Metal-density-driven Placement for {CMP} Variation and Routability},
    author  = {Chen, Tung-Chieh and Cho, Minsik and David Z.~Pan and Chang, Yao-Wen},
    journal = tcad,
    volume  = {27},
    number  = {12},
    pages   = {2145--2155},
    year    = {2008},
}
@inproceedings{DFMP-ISPD2007-Hu,
    author    = {Hu, Shiyan and Hu, Jiang},
    title     = {Pattern sensitive placement for manufacturability},
    booktitle = ispd,
    year      = {2007},
    pages     = {27--34},
}
@article{DFMP-TVLSI2010-Hu,
    title   = {Pattern sensitive placement perturbation for manufacturability},
    author  = {Hu, Shiyan and Shah, Patrik and Hu, Jiang},
    journal = tvlsi,
    volume  = {18},
    number  = {6},
    pages   = {1002--1006},
    year    = {2010},
}
@inproceedings{DFMP-ASPDAC2014-Shim,
    title     = {Lithographic defect aware placement using compact standard Cells without inter-cell margin},
    author    = {Shim, Seongbo and Lee, Yoojong and Shin, Youngsoo},
    booktitle = aspdac,
    pages     = {47--52},
    year      = {2014},
}
@inproceedings{DFMP-DATE2014-Du,
    title     = {Optimization of standard cell based detailed placement for 16 nm {FinFET} process},
    author    = {Du, Yuelin and Martin D.~F.~Wong},
    booktitle = date,
    pages     = {357:1--357:6},
    year      = {2014},
}
%}}}
% ==== DPL aware placement
%{{{
@inproceedings{DFMP-ICCAD2009-Gupta,
    title     = {Timing yield-aware color reassignment and detailed placement perturbation for double patterning lithography},
    author    = {Gupta, Mohit and Jeong, Kwangok and Kahng, Andrew B},
    booktitle = iccad,
    pages     = {607--614},
    year      = {2009},
}
@article{DFMP-TCAD2010-Gupta,
    author   = {Gupta, Mohit and Jeong, Kwangok and Kahng, Andrew B.},
    title    = {Timing yield-aware color reassignment and detailed placement perturbation for bimodal {CD} distribution in double patterning lithography},
    journal  = tcad, 
    volume   = {29},
    number   = {8},
    month    = {aug},
    year     = {2010},
    pages    = {1229--1242},
    numpages = {14},
} 
@inproceedings{DFMP-SPIE2011-Liebmann,
    title     = {Decomposition-aware standard cell design flows to enable double-patterning technology},
    author    = {Liebmann, Lars and Pietromonaco, David and Graf, Matthew},
    booktitle = spie,
    volume    = 7974,
    year      = {2011},
}
@misc{DFMP-USP2013-Agarwal,
    title  = {Multi-patterning lithography aware cell placement in integrated circuit design},
    author = {Agarwal, Kanak Behari and Alpert, Charles Jay and Li, Zhuo and Nam, Gi-Joon and Viswanathan, Natarajan},
    year   = {2013},
    month  = jul # "~23",
    note   = {{US} Patent 8,495,548},
}
%}}}
% ==== TPL aware placement
%{{{
@inproceedings{DFMP-ICCAD2013-Yu,
    title     = {Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography},
    author    = {Bei Yu and Xiaoqing Xu and Gao, Jhih-Rong and David Z.~Pan},
    booktitle = iccad,
    pages     = {349--356},
    year      = {2013},
    location  = {San Jose, California},
}
@inproceedings{DFMP-ICCAD2014-Tian,
    title     = {Triple patterning aware detailed placement with constrained pattern assignment},
    author    = {Tian, Haitong and Du, Yuelin and Zhang, Hongbo and Xiao, Zigang and Martin D.~F.~Wong},
    booktitle = iccad,
    pages     = {116--123},
    year      = {2014},
}
@inproceedings{DFMP-ICCAD2014-Kuang,
    title     = {Triple patterning lithography aware optimization for standard cell based design},
    author    = {Kuang, Jian and Chow, Wing-Kai and Evangeline F.~Y.~Young},
    booktitle = iccad,
    pages     = {108--115},
    year      = {2014},
}
@inproceedings{DFMP-ISPD2015-Lin,
    title     = {{TPL}-Aware Displacement-driven Detailed Placement Refinement with Coloring Constraints},
    author    = {Lin, Tao and Chu, Chris},
    booktitle = ispd,
    pages     = {75--80},
    year      = {2015},
}
@article{DFMP-TCAD2015-Yu,
    title   = {Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography}, 
    author  = {Bei Yu and Xiaoqing Xu and Jhih-Rong Gao and Yibo Lin and Zhuo Li and Charles Alpert and David Z.~Pan}, 
    journal = tcad,
    month   = {May}, 
    volume  = {34}, 
    number  = {5}, 
    pages   = {726--739}, 
    year    = {2015}, 
}
@article{DFMP-TCAD2015-Chien,
    title   = {On Refining Row-Based Detailed Placement for Triple Patterning Lithography},
    author  = {Chien, Hsi-An and Chen, Ye-Hong and Han, Szu-Yaun and Lai, Hsiu-Yu and Wang, Ting-Chi},
    journal = tcad,
    volume  = {34},
    number  = {5},
    pages   = {778--793},
    year    = {2015},
}
@inproceedings{DFMP-ICCAD2015-Lin,
    title     = {Triple Patterning Aware Detailed Placement Toward Zero Cross-Row Middle-of-Line Conflict},
    author    = {Yibo Lin and Bei Yu and Biying Xu and David Z.~Pan},
    booktitle = iccad,
    pages     = {396--403},
    year      = {2015},
}
@article{DFMP-TCAD2017-Lin,
    title     = {Triple Patterning Aware Detailed Placement Toward Zero Cross-Row Middle-of-Line Conflict},
    author    = {Yibo Lin and Bei Yu and Biying Xu and David Z.~Pan},
    journal   = tcad,
    volume    = {36}, 
    number    = {7}, 
    pages     = {1140--1152}, 
    year      = {2017},
}
%}}}
% ==== SAMP aware placement
@inproceedings{DFMP-SPIE2013-Gao,
    title     = {Self-aligned Double Patterning Friendly Configuration for Standard Cell Library Considering Placement},
    author    = {Jhih-Rong Gao and Bei Yu and Ru Huang and David Z.~Pan},
    booktitle = spie,
    volume    = {8684},
    year      = {2013},
}
@inproceedings{DFMP-SPIE2015-Nakajima,
    title     = {Self-aligned quadruple patterning-compliant placement},
    author    = {Nakajima, Fumiharu and Kodama, Chikaaki and Nakayama, Koichi and Nojima, Shigeki and Kotani, Toshiya},
    booktitle = spie,
    volume    = {9427},
    year      = {2015},
}
% ==== EBL aware placement
@inproceedings{DFMP-ASPDAC2016-Lin,
    title     = {Stitch Aware Detailed Placement for Multiple E-Beam Lithography},
    author    = {Yibo Lin and Bei Yu and Yi Zou and Zhuo Li and Charles J.~Alpert and David Z.~Pan},
    booktitle = aspdac,
    pages     = {186--191},
    year      = {2016},
}
@article{DFMP-JVLSI2017-Lin,
    title   = {Stitch aware detailed placement for multiple E-beam lithography},
    author  = {Yibo Lin and Bei Yu and Yi Zou and Zhuo Li and Charles J.~Alpert and David Z.~Pan},
    journal = jvlsi,
    volume  = {58},
    pages   = {47--54},
    year    = {2017},
}
% ==== EUV aware placement
@inproceedings{DFMP-ICCD2014-Liu,
    title     = {Simultaneous {EUV} flare-and {CMP}-aware placement},
    author    = {Liu, Chi-Yuan and Chang, Yao-Wen},
    booktitle = iccd,
    pages     = {249--255},
    year      = {2014},
}
% ==== DSA aware placement
@inproceedings{DFMP-ICCAD2015-Shim,
    title     = {Defect Probability of Directed Self-Assembly Lithography: Fast Identification and Post-Placement Optimization},
    author    = {Seongbo Shim and Woohyun Chung and Youngsoo Shin},
    booktitle = iccad,
    pages     = {404--409},
    year      = {2015},
}
@inproceedings{DFMP-ASPDAC2016-Xiao,
    title     = {Contact layer decomposition to enable {DSA} with multi-patterning technique for standard cell based layout},
    author    = {Xiao, Zigang and Lin, Chun-Xun and Wong, Martin D.~F. and Zhang, Hongbo},
    booktitle = aspdac,
    pages     = {95--102},
    year      = {2016},
}
%}}}


% ===================================================
%                Layout Optimization 
% ===================================================
% ==== gridded design rule (GDR) layout
%{{{
@inproceedings{GDR-SPIE2010-Lam,
    title     = {E-beam direct write ({EBDW}) as complementary lithography},
    author    = {David Lam and Dave Liu and Ted Prescop},
    booktitle = spie,
    volume    = {7823},
    year      = {2010},
}
@inproceedings{GDR-SPIE2011-Lam,
    title     = {E-beam to complement optical lithography for {1D} layouts},
    author    = {David Lam and Enden D.~Liu and Michael C.~Smayling and Ted Prescop},
    booktitle = spie,
    volume    = {7970},
    year      = {2011},
}
@inproceedings{GDR-ASPDAC2011-Zhang,
    title     = {Mask cost reduction with circuit performance consideration for self-aligned double patterning},
    author    = {Zhang, Hongbo and Du, Yuelin and Wong, M.~D.~F. and Chao, Kai-Yuan},
    booktitle = aspdac,
    pages     = {787--792},
    year      = {2011},
}
@inproceedings{GDR-ISQED2011-Zhang,
    title     = {Lithography-aware layout modification considering performance impact},
    author    = {Zhang, Hongbo and Du, Yuelin and Wong, Martin D.~F. and Chao, Kai-Yuan},
    booktitle = isqed,
    pages     = {1--5},
    year      = {2011},
}
@inproceedings{GDR-ASPDAC2012-Du,
    title     = {Hybrid lithography optimization with e-beam and immersion processes for 16nm {1D} gridded design},
    author    = {Yuelin Du and Hongbo Zhang and Martin D.~F.~Wong and Kai-Yuan Chao},
    booktitle = aspdac,
    pages     = {707--712},
    year      = {2012},
}
@inproceedings{GDR-DAC2014-Ding,
    title     = {Throughput Optimization for {SADP} and E-beam based Manufacturing of {1D} Layout},
    author    = {Yixiao Ding and Chris Chu and Wai-Kei Mak},
    booktitle = dac,
    pages     = {51:1--51:6},
    year      = {2014},
}
@inproceedings{GDR-SPIE2015-Han,
    title     = {{ILP}-based co-optimization of cut mask layout, dummy fill, and timing for sub-14nm {BEOL} technology},
    author    = {Han, Kwangsoo and Kahng, Andrew B. and Lee, Hyein and Wang, Lutong},
    booktitle = spie,
    volume    = {9635},
    year      = {2015},
}
@inproceedings{GDR-SPIE2015-Wang,
    title     = {Study of cut mask lithography options for sub-20nm metal routing},
    author    = {Wang, Yan and Kim, Ryoung-Han and Yuan, Lei and Chunder, Anindarupa and Wang, Chenchen and Zeng, Jia and Woo, Youngtag and Kye, Jongwook},
    booktitle = spie-al,
    volume    = {9426},
    year      = {2015},
}
@inproceedings{GDR-ICCAD2016-Kuang,
    title     = {Incorporating cut redistribution with mask assignment to enable {1D} gridded design},
    author    = {Kuang, Jian and Young, Evangeline F.~Y. and Yu, Bei},
    booktitle = iccad,
    pages     = {48:1--48:8},
    year      = {2016},
}
@inproceedings{GDR-ASPDAC2017-Zhang,
    title     = {Network Flow Based Cut Redistribution and Insertion for Advanced {1D} Layout Design},
    author    = {Ye Zhang and Wai-Shing Luk and Fan Yang and Changhao Yan and Hai Zhou and Dian Zhou and Xuan Zeng},
    booktitle = aspdac,
    pages     = {360--365},
    year      = {2017},
}
%}}}
% ==== general layout optimization
@inproceedings{DFM-SPIE2017-Dai,
    title     = {Optimization of complex high-dimensional layout configurations for {IC} physical designs using graph search, data analytics, and machine learning},
    author    = {Dai, Vito and Teoh, Edward Kah Ching and Xu, Ji and Rangarajan, Bharath},
    booktitle = spie-al,
    volume    = {10148},
    year      = {2017},
}



% ===================================================
%                   CMP
% ===================================================
%{{{
@inproceedings{CMP-ASPDAC1999-Kahng,
    title     = {New multilevel and hierarchical algorithms for layout density control},
    author    = {Kahng, Andrew B and Robins, Gabriel and Singh, Anish and Zelikovsky, Alexander},
    booktitle = aspdac,
    pages     = {221--224},
    year      = {1999},
}
@article{CMP-TCAD1999-Kahng,
    title     = {Filling algorithms and analyses for layout density control},
    author    = {Kahng, Andrew B. and Robins, Gabriel and Singh, Anish and Zelikovsky, Alexander},
    journal   = tcad,
    volume    = {18},
    number    = {4},
    pages     = {445--462},
    year      = {1999},
    publisher = {IEEE},
    abstract  = {LP formulation},
}
@inproceedings{CMP-ASPDAC2000-Chen,
    title     = {{Monte-Carlo} algorithms for layout density control},
    author    = {Chen, Yu and Kahng, Andrew B. and Robins, Gabriel and Zelikovsky, Alex},
    booktitle = aspdac,
    pages     = {523--528},
    year      = {2000},
    abstract  = {Monte Carlo based method},
}
@inproceedings{CMP-DAC2000-Chen,
    title     = {Practical iterated fill synthesis for {CMP} uniformity},
    author    = {Chen, Yu and Kahng, Andrew B. and Robins, Gabriel and Zelikovsky, Alexander},
    booktitle = dac,
    year      = {2000},
    pages     = {671--674},
    abstract  = {LP + Monte-Carlo},
}
@inproceedings{CMP-DAC2000-Tian,
    title     = {Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability},
    author    = {Tian, Ruiqi and Martin D.~F.~Wong and Boone, Robert},
    booktitle = dac,
    pages     = {667--670},
    year      = {2000},
}
@article{CMP-TCAD2001-Tian,
    title     = {Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability},
    author    = {Tian, Ruiqi and Martin D.~F.~Wong and Boone, Robert},
    journal   = tcad,
    volume    = {20},
    number    = {7},
    pages     = {902--910},
    year      = {2001},
    publisher = {IEEE},
}
@inproceedings{CMP-ISPD2002-Chen,
    title     = {Closing the smoothness and uniformity gap in area fill synthesis},
    author    = {Chen, Yu and Kahng, Andrew B. and Robins, Gabriel and Zelikovsky, Alexander},
    booktitle = ispd,
    pages     = {137--142},
    year      = {2002},
}
@inproceedings{CMP-SPIE2003-Ellis,
    title     = {Compression algorithms for dummy-fill {VLSI} layout data},
    author    = {Ellis, Robert B. and Kahng, Andrew B. and Zheng, Yuhong},
    booktitle = spie,
    volume    = 5042,
    pages     = {233--245},
    year      = {2003},
}
@inproceedings{CMP-SPIE2003-Chen,
    title     = {Performance-impact limited-area fill synthesis},
    author    = {Chen, Yu and Gupta, Puneet and Kahng, Andrew B.},
    booktitle = spie,
    volume    = 5042,
    pages     = {75--86},
    year      = {2003},
}
@inproceedings{CMP-DAC2003-Chen,
    title     = {Performance-impact Limited Area Fill Synthesis},
    author    = {Chen, Yu and Gupta, Puneet and Kahng, Andrew B.},
    booktitle = dac,
    year      = {2003},
    pages     = {22--27},
} 
@inproceedings{CMP-VLSIMI2005-Kahng,
    title     = {Closing the Loop in Interconnect Analyses and Optimization: {CMP} Fill, Lithography and Timing},
    author    = {Puneet Gupta and Andrew B.~Kahng and O.~Sam Nakagawa and Kambiz Samadi},
    booktitle = {Proc.~VMIC},
    year      = {2005},
    pages     = {352--363},
}
@inproceedings{CMP-ISQED2005-Wang,
    title     = {A min-variance iterative method for fast smart dummy feature density assignment in chemical-mechanical polishing},
    author    = {Wang, Xin and Chiang, Charles C. and Kawa, Jamil and Su, Qing},
    booktitle = isqed,
    year      = {2005},
    pages     = {258--263},
}
@inproceedings{CMP-ISQED2006-Kahng, 
    title     = {Study of floating fill impact on interconnect capacitance}, 
    author    = {A.~B.~Kahng and K.~Samadi and P.~Sharma}, 
    booktitle = isqed,
    year      = {2006}, 
}
@inproceedings{CMP-EDSSC2007-Nan, 
    title     = {Impact of Metal Dummy Fills on the Performance of {CMOS} Inductors}, 
    author    = {L. Nan and K. Mouthaan and Y. Xiong and J. Shi and S. C. Rustagi and B. Ooi}, 
    year      = {2007}, 
    booktitle = {Prof.~EDSSC},
}
@inproceedings{CMP-VMIC2007-Kahng,
    title     = {Performance-aware {CMP} fill pattern optimization},
    author    = {Andrew B.~Kahng and Topaloglu, Rasit O.},
    booktitle = {Proc.~VMIC},
    year      = {2007},
}
@inproceedings{CMP-ISPD2007-Xiang,
    title     = {Dummy fill density analysis with coupling constraints},
    author    = {Xiang, Hua and Deng, Liang and Puri, Ruchir and Chao, Kai-Yuan and Martin D.~F.~Wong},
    booktitle = ispd,
    pages     = {3--10},
    year      = {2007},
    abstract  = {},
}
@inproceedings{CMP-ISQED2007-Kahng,
    title     = {A {DOE} set for normalization-based extraction of fill impact on capacitances},
    author    = {Kahng, Andrew B. and Topaloglu, Rasit Onur},
    booktitle = isqed,
    pages     = {467--474},
    year      = {2007},
    abstract  = {},
}
@inproceedings{CMP-ISQED2007-Topaloglu,
    title     = {Energy-minimization model for fill synthesis},
    author    = {Rasit Onur Topaloglu},
    booktitle = isqed,
    pages     = {444--451},
    year      = {2007},
}
@inproceedings{CMP-ISQED2005-Kurokawa,
    title     = {Dummy filling methods for reducing interconnect capacitance and number of fills},
    author    = {A. Kurokawa and T. Kanamoto and T. Ibe and A. Kasebe and Chang Wei Fong and T. Kage and Y. Inoue and H. Masuda},
    booktitle = isqed,
    pages     = {586--591}, 
    year      = {2005}, 
}
@article{CMP-TCAD2008-Kahng,
    title     = {{CMP} fill synthesis: A survey of recent studies},
    author    = {Kahng, Andrew B. and Samadi, Kambiz},
    journal   = tcad,
    volume    = {27},
    number    = {1},
    pages     = {3--19},
    year      = {2008},
    abstract  = {},
}
@article{CMP-TCAD2008-Xiang,
    title    = {Fast dummy-fill density analysis with coupling constraints},
    author   = {Xiang, Hua and Deng, Liang and Puri, Ruchir and Chao, Kai-Yuan and Martin D.~F.~Wong},
    journal  = tcad,
    volume   = {27},
    number   = {4},
    pages    = {633--642},
    year     = {2008},
    abstract = {},
}
@inproceedings{CMP-DAC2009-Feng,
    title     = {Provably good and practically efficient algorithms for {CMP}},
    author    = {Feng, Chunyang and Zhou, Hai and Yan, Changhao and Tao, Jun and Zeng, Xuan},
    booktitle = dac,
    pages     = {539--544},
    year      = {2009},
    abstract  = {},
}
@inproceedings{CMP-ISPD2010-Chen,
    title     = {Density gradient minimization with coupling-constrained dummy fill for {CMP} control},
    author    = {Chen, Huang-Yu and Chou, Szu-Jui and Chang, Yao-Wen},
    booktitle = ispd,
    pages     = {105--111},
    year      = {2010},
    abstract  = {},
}
@article{CMP-TCAD2011-Feng,
    title    = {Efficient Approximation Algorithms for Chemical Mechanical Polishing Dummy Fill},
    author   = {Feng, Chunyang and Zhou, Hai and Yan, Changhao and Tao, Jun and Zeng, Xuan},
    journal  = tcad,
    volume   = {30},
    number   = {3},
    pages    = {402--415},
    year     = {2011},
    abstract = {},
}
@article{CMP-JVLSI2013-Wu,
    title     = {An efficient method for gradient-aware dummy fill synthesis},
    author    = {Wu, Peng and Zhou, Hai and Yan, Changhao and Tao, Jun and Zeng, Xuan},
    journal   = jvlsi,
    volume    = {46},
    number    = {3},
    pages     = {301--309},
    year      = {2013},
    publisher = {Elsevier},
}
@inproceedings{CMP-ICCAD2014-Topaloglu,
    title     = {{ICCAD-2014 CAD} Contest in Design for Manufacturability Flow for Advanced Semiconductor Nodes and Benchmark Suite},
    author    = {Topaloglu, Rasit O.},
    booktitle = iccad,
    year      = {2014},
    pages     = {367--368},
}
@inproceedings{CMP-ICCAD2018-Yang,
    author    = {Bo, Yang and Sriraaman, Sridharan},
    title     = {{ICCAD-2018 CAD} Contest in Timing-Aware Fill Insertion},
    booktitle = iccad,
    year      = {2018},
}  
@inproceedings{CMP-DAC2015-Lin,
    title     = {High performance dummy fill insertion with coupling and uniformity constraints},
    author    = {Yibo Lin and Bei Yu and David Z.~Pan},
    booktitle = dac,
    pages     = {71:1--71:6},
    year      = {2015},
}
@inproceedings{CMP-ISVLSI2015-Liu,
    title     = {An Effective Chemical Mechanical Polishing Filling Approach},
    author    = {Liu, Chuangwen and Tu, Peishan and Wu, Pangbo and Tang, Haomo and Jiang, Yande and Kuang, Jian and Evangeline F.~Y.~Young},
    booktitle = isvlsi,
    pages     = {44--49},
    year      = {2015},
}
@inproceedings{CMP-ICCAD2016-Tao,
    title     = {A Novel Unified Dummy Fill Insertion Framework with {SQP}-based Optimization Method},
    author    = {Tao, Yudong and Yan, Changhao and Lin, Yibo and Wang, Sheng-Guo and Pan, David Z. and Zeng, Xuan},
    booktitle = iccad,
    pages     = {88:1--88:8},
    year      = {2016},
} 
@article{CMP-TCAD2017-Lin,
    title     = {High performance dummy fill insertion with coupling and uniformity constraints},
    author    = {Yibo Lin and Bei Yu and David Z.~Pan},
    journal   = tcad,
    year      = {2017},
    volume    = {36}, 
    number    = {9}, 
    pages     = {1532--1544},
    publisher = {IEEE},
}
%}}}


% ====================================================
%                   EBL 
% ====================================================
% ==== EBL summary
%{{{
% ==== industry tools
@article{EBL-JMEE2010-PML2,
  title     ={Projection mask-less lithography ({PML2})},
  author    ={Klein, Christof and Klikovits, Jan and Szikszai, Laszlo and Platzgummer, Elmar and Loeschner, Hans},
  journal   =jmee,
  volume    ={87},
  number    ={5},
  pages     ={1154--1158},
  year      ={2010},
  publisher ={Elsevier},
}
@inproceedings{EBL-SPIE2012-REBL,
  title     = {{REBL}: design progress toward 16 nm half-pitch maskless projection electron beam lithography},
  author    = {McCord, Mark A and Petric, Paul and Ummethala, Upendra and Carroll, Allen and Kojima, Shinichi and Grella, Luca and Shriyan, Sameet and Rettner, Charles T and Bevis, Chris F},
  booktitle = spie,
  volume    = {8323},
  year      = {2012},
}
@inproceedings{EBL-SPIE2009-MAPPER,
  title     = {{MAPPER}: high-throughput maskless lithography},
  author    = {M. Wieland and G. Boer and G. Berge and R. Jager and T. Peut and J. Peijster and E. Slot and S. Steenbrink and T. Teepen and A. Veen and B. Kampherbeek},
  booktitle = spie,
  volume    = {7378},
  Year      = 2009,
}
@inproceedings{EBL-SPIE2010-MAPPER,
  title     = {{MAPPER}: high-throughput maskless lithography},
  author    = {Wieland, MJ and De Boer, G and Ten Berge, GF and Van Kervinck, M and Jager, R and Peijster, JJM and Slot, E and Steenbrink, SWHK and Teepen, TF and Kampherbeek, BJ},
  booktitle = spie,
  volume    = {7637},
  year      = {2010},
}
@inproceedings{EBL-SPIE2011-MAPPER,
  title     = {Scanning exposures with a {MAPPER} multibeam system},
  author    = {Van den Berg, C and De Boer, G and Boschker, S and Hakkennes, EA and Holgate, G and Hoving, M and Jager, R and Koning, JJ and Kuiper, V and Ma, Yue and others},
  booktitle = spie,
  volume    = {7970},
  year      = {2011},
}

% ==== overview
@inproceedings{EBL-SPIE2005-Pain,
  title     = {Electron beam direct write lithography flexibility for {ASIC} manufacturing an opportunity for cost reduction},
  author    = {L. Pain and M. Jurdit and J. Todeschini and S. Manakli and B. Icard and B. Minghetti and G. Bervin and A. Beverina and F. Leverd and M. Broekaart and P. Gouraud and V. De Jonghe and Ph. Brun and S. Denorme and F. Boeuf and V. Wang and D. Henry},
  booktitle = spie,
  volume    = {5751},
  year      = {2005},
}
@inproceedings{EBL-SPIE2007-Cheng,
  title     = {Fundamental limit of ebeam lithography},
  author    = {Cheng, Wen-Hao and Farnsworth, Jeff},
  booktitle = spie,
  volume    = {6607},
  year      = {2007},
  abstract  = {resolution limit of EBL},
}
@inproceedings{EBL-SPIE2009-Pfeiffer,
  title     = {New prospects for electron beams as tools for semiconductor lithography},
  author    = {Hans C. Pfeiffer},
  booktitle = spie,
  volume    = {7378},
  year      = {2009},
}
@inproceedings{EBL-ICCAD2009-Fujimura,
  title     = {Beyond Light: The Growing Importance of E-beam},
  author    = {Aki Fujimura},
  booktitle = iccad,
  year      = {2009},
}
@article{EBL-JVSTB2009-Cord,
  title     = {Limiting factors in sub-10nm scanning-electron-beam lithography},
  author    = {{Cord}, B. and {Yang}, J. and {Duan}, H. and {Joy}, D.~C. and {Klingfus}, J. and {Berggren}, K.~K.},
  journal   = {Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures},
  year      = 2009,
  volume    = 27,
}
@inproceedings{EBL-SPIE2010-Gramss,
  title     = {Multi-Shaped {E-Beam} Technology for Mask Writing},
  author    = {Juergen Gramss and Arnd Stoeckel and Ulf Weidenmueller and Hans-Joachim Doering and Martin Bloecker and Martin Sczyrba and Michael Finken and Timo Wandel and Detlef Melzer},
  booktitle = spie,
  volume    = {7823},
  year      = {2010},
}
@inproceedings{EBL-SPIE2011-Lee,
  title     = {The requirements for the future e-beam mask writer: statistical analysis of pattern accuracy},
  author    = {Sang Hee Lee and Jin Choi and Hee Bom Kim and Byung Gook Kim and Han-Ku Cho},
  booktitle = spie,
  volume    = {8166},
  year      = {2011},
}
@inproceedings{EBL-SPIE2012-Sugatani,
  title     = {Feasibility study of character projection based electron beam direct writing for logic {LSI} wiring including automatically routed area with 14nm node technology case},
  author    = {Shinji Sugatani and Takashi Maruyama and Yoshinori Kojima and Yasushi Takahashi and Masaki Takakuwa and Shuzo Ohshio and Masaru Ito},
  booktitle = spie,
  volume    = {8323},
  year      = {2012},
}
@inproceedings{EBL-SPIE2011-Hakkennes,
  title     = {Demonstration of real-time pattern correction for high-throughput maskless lithography},
  author    = {Hakkennes, EA and Wiersma, AD and Hoving, M and Venema, N and Woutersen, S and Van de Peut, T and Sanderse, M and Wieland, MJ},
  booktitle = spie,
  volume    = {7970},
  year      = {2011},
}
@inproceedings{EBL-SPIE2010-Rouse,
  title     = {E-beam maskless lithography: prospects and challenges},
  author    = {Ronse, Kurt},
  booktitle = spie,
  volume    = {7637},
  year      = {2010},
  abstract  = {invited review paper, regarding EBL and MEBL},
}
@article{EBL-JMEE2001-Chang,
  title     = {Multiple electron-beam lithography},
  author    = {Chang, THP and Mankos, Marian and Lee, Kim Y and Muray, Larry P},
  journal   = jmee,
  volume    = {57},
  pages     = {117--135},
  year      = {2001},
  publisher = {Elsevier},
  abstract  = {},
}
@article{EBL-JM3-2012-Lin,
  title     = {Future of multiple-e-beam direct-write systems},
  author    = {Burn J Lin},
  journal   = jm3,
  volume    = {11},
  number    = {3},
  pages     = {033011--1},
  year      = {2012},
  publisher = {International Society for Optics and Photonics},
  abstract  = {},
}
%}}}
# ==== design for ebeam (DFEB)
%{{{
@inproceedings{EBL-SPIE2010-Fujimura,
  title     = {Design for {E-Beam}: design insights for direct-write maskless lithography},
  author    = {Aki Fujimura},
  booktitle = spie,
  volume    = {7823},
  year      = {2010},
}
@inproceedings{EBL-ISQED2010-Fujimura,
  title     = {Design for {E-Beam}: Getting the Best Wafers Without the Exploding Mask Cost},
  author    = {Aki Fujimura},
  booktitle = isqed,
  year      = {2010},
}
@inproceedings{EBL-ICCADWS2011-Bomholt,
  title     = {{E-B}eam Direct-Write and {EDA}},
  author    = {Lars Bomholt}, 
  booktitle = {ICCAD Workshop},
  year      = {2011},
}
%}}}
% ==== CP/MCC Summary
%{{{
@inproceedings{EBL-SPIE2004-Yasuda,
  author    = {Hiroshi Yasuda and Takeshi Haraguchi and Akio Yamada},
  title     = {A proposal for an {MCC} (Multi-column cell with lotus root lens) system to be used as a mask-making e-beam tool},
  booktitle = spie,
  volume    = {5567},
  year      = {2004},
}
@inproceedings{EBL-SPIE2008-Maruyama,
  author    = {T. Maruyama and M. Takakuwa and Y. Kojima and Y. Takahashi and K. Yamada and J. Kon and M. Miyajima and A. Shimizu and Y. Machida and H. Hoshino and H. Takita and S. Sugatani and H. Tsuchikawa},
  title     = {{EBDW} technology for {EB} shuttle at 65nm node and beyond},
  booktitle = spie,
  volume    = {6921},
  year      = {2008},
  abstract  = {model, master CP}
}
@inproceedings{EBL-SPIE2009-Manakli,
  title     = {Cell projection use in mask-less lithography for 45nm \& 32nm logic nodes},
  author    = {S. Manakli and H. Komami and M. Takizawa and T.Mitsuhashi and L. Pain},
  booktitle = spie,
  volume    = {7271},
  year      = {2009},
}
@inproceedings{EBL-SPIE2010-Shoji,
  title     = {Extraction and utilization of the repeating patterns for {CP} writing in mask making},
  author    = {Masahiro Shoji and Tadao Inoue and Masaki Yamabe},
  booktitle = spie,
  volume    = {7748},
  year      = {2010},
}
@inproceedings{EBL-SPIE2012-Kojima,
  title     = {Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond},
  author    = {Yoshinori Kojima and Yasushi Takahashi and Masaki Takakuwa and Shuzo Ohshio and Shinji Sugatani and Ryo Tujimura and Hiroshi Takita and Kozo Ogino and Hiromi Hoshino and Yoshio Ito and Masaaki Miyajima and Jun-ichi Kond},
  booktitle = spie,
  volume    = {8323},
  year      = {2012},
}
@inproceedings{EBL-SPIE2010-Maruyama,
  title     = {{CP} based {EBDW} throughput enhancement for 22nm high volume manufacturing},
  author    = {Takashi Maruyama and Y.Machida and S.Sugatani},
  booktitle = spie,
  volume    = {7637},
  year      = {2010},
}
@inproceedings{EBL-SPIE2012-Maruyama,
  title     = {{CP} element based design for 14nm node {EBDW} high volume manufacturing},
  author    = {Takashi Maruyama and Yasuhide Machida and Shinji Sugatani and Hiroshi Takita and Hiromi Hoshino and Toshio Hino and Masaru Ito and Akio Yamada and Tetsuya Iizuka and Satoshi Komatsue and Makoto Ikeda and Kunihiro Asada},
  booktitle = spie,
  volume    = {8323},
  year      = {2012},
}
%}}}
% ==== Stencil Planning
%{{{
@inproceedings{EBL-SPIE2008-Minh,
  title     = {Shot minimization for throughput improvement of character projection electron beam direct writing},
  author    = {Hai Pham Dinh Minh and Tetsuya Iizuka and Makoto Ikeda and Kunihiro Asada},
  booktitle = spie,
  volume    = {6921},
  year      = {2006},
  abstract  = {},
}
@inproceedings{EBL-USP2010-Fujimura,
  title     = {Stencil Design and Method for Improving Character Density for Cell Projection Charged Particle Beam Lithography},
  author    = {Akira Fujimura and Takashi Mitsuhashi and Kenji Yoshida and Shohei Matsushita and Larry Lam Chau and Tam Dinh Thanh Nguyen and Donald MacMillen},
  booktitle = {{US Patent}},
  year      = {2010},
}
@inproceedings{EBL-SPIE2006-Sugihara,
  title     = {{CP} mask optimization for enhancing the throughput of {MCC} systems},
  author    = {Makoto Sugihara and Kenta Nakamura and Yusuke Matsunaga and Kazuaki Murakami},
  booktitle = spie,
  volume    = {6349},
  year      = {2006},
}
@article{EBL-IEICE2006-Sugihara,
  title   = {Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment},
  author  = {Makoto Sugihara and Taiga Takata and Kenta Nakamura and Ryoichi Inanami and Hiroaki Hayashi and Katsumi Kishimoto and Tetsuya Hasebe and Yukihiro Kawano and Yusuke Matsunaga and Kazuaki Murakami and Katsuya Okumura},
  journal = {IEICE Transactions on Electronics},
  year    = {2006},
  volume  = {E89-C},
  pages   = {377--383},
}
@inproceedings{EBL-ISPD2011-Yuan,
  title     = {{E-B}eam Lithography Throughput Improvement with Stencil Planning and Optimization},
  author    = {Kun Yuan and David Z.~Pan},
  booktitle = ispd,
  year      = {2011},
  pages     = {151--158},
  abstract  = {},
}
@article{EBL-TCAD2012-Yuan,
  title   = {{E-B}eam Lithography Stencil Planning and Optimization With Overlapped Characters}, 
  author  = {Kun Yuan and Bei Yu and David Z.~Pan},
  journal = tcad,
  year    = {2012}, 
  month   = {Feb.}, 
  volume  = {31}, 
  number  = {2}, 
  pages   = {167--179},
}
@inproceedings{EBL-DAC2013-Yu,
  title     = {{E-BLOW: E-Beam} Lithography Overlapping aware Stencil Planning for {MCC} System},
  author    = {Bei Yu and Kun Yuan and Jhih-Rong Gao and David Z.~Pan},
  booktitle = dac,
  pages     = {70:1--70:7},
  year      = {2013},
}
@article{EBL-TCAD2014-Mak,
  author   = {Wai-Kei Mak and Chris Chu},
  title    = {{E-Beam} Lithography Character and Stencil Co-Optimization},
  journal  = tcad,
  month    = {May}, 
  volume   = {33}, 
  number   = {5}, 
  pages    = {741--751}, 
  year     = {2014},
  abstract = {TODO: more details},
}
@inproceedings{EBL-ASPDAC2014-Chu, 
  title     = {Flexible packed stencil design with multiple shaping apertures for e-beam lithography}, 
  author    = {Chris Chu and Wai-Kei Mak}, 
  booktitle = aspdac,
  year      = {2014}, 
  pages     = {137--142}, 
  abstract  = {},
}
@inproceedings{EBL-ISPD2014-Kuang,
  title     = {A Highly-Efficient Row-Structure Stencil Planning Approach for {E-Beam} Lithography with Overlapped Characters},
  author    = {Jian Kuang and Evangeline F.~Y.~Young},
  booktitle = ispd,
  year      = {2014},
  pages     = {109--116},
  abstract  = {1d-osp},
}
@inproceedings{EBL-ICCAD2014-Kuang,
  title     = {Overlapping-aware Throughput-driven Stencil Planning for E-Beam Lithography},
  author    = {Jian Kuang and Evangeline F.~Y.~Young},
  booktitle = iccad,
  year      = {2014},
  pages     = {254--261},
  abstract  = {2d-osp},
}
@inproceedings{EBL-ASPDAC2015-Guo, 
  title     = {Polynomial time optimal algorithm for stencil row planning in {E-Beam} lithography},
  author    = {Daifeng Guo and Yuelin Du and Martin D.~F.~Wong},
  booktitle = aspdac,
  year      = {2015}, 
  pages     = {658--664}, 
  abstract  = {1d-osp},
}
@article{EBL-TODAES2016-Yu,
  title     = {{EBL} Overlapping Aware Stencil Planning for {MCC} System},
  author    = {Yu, Bei and Yuan, Kun and Gao, Jhih-Rong and Hu, Shiyan and Pan, David Z.},
  journal   = todaes,
  volume    = {21},
  number    = {3},
  pages     = {43},
  year      = {2016},
  publisher = {ACM},
}
%}}}
% ==== Character Design
%{{{
@inproceedings{EBL-SPIE2005-Fujino,
  author    = {Takeshi Fujino and Yoshihiko Kajiya and Masaya Yoshikawa},
  title     = {Character-build standard-cell layout technique for high-throughput character-projection {EB} lithography},
  booktitle = spie,
  volume    = {5853},
  year      = {2005},
}
@inproceedings{EBL-SPIE2007-Sugihara,
  title     = {Technology mapping technique for throughput enhancement of character projection equipment},
  author    = {Makoto Sugihara and Taiga Takata and Kenta Nakamura and Ryoichi Inanami and Hiroaki Hayashi and Katsumi Kishimoto and Tetsuya Hasebe and Yukihiro Kawano and Yusuke Matsunaga and Kazuaki Murakami and Katsuya Okumurae},
  booktitle = spie,
  volume    = {6151},
  year      = {2007},
}
@inproceedings{EBL-ISCAS2006-Sugihara,
  title     = {A character size optimization technique for throughput enhancement of character projection lithography},
  author    = {Sugihara, M. and Takata, T. and Nakamura, K. and Inanami, Rx. and Inanami, R. and Hayashi, H. and Kishimoto, K. and Hasebe, T. and Kawano, Y. and Matsunaga, Y. and Murakami, K. and Okumura, K.},
  booktitle = iscas,
  year      = {2006},
  pages     = {2561--2564},
}
@inproceedings{EBL-SPIE2009-Sugihara,
  title     = {Optimal Character-Size Exploration for Increasing Throughput of {MCC} Lithographic Systems},
  author    = {Makoto Sugihara},
  booktitle = spie,
  year      = {2009},
  volume    = {7271},
}
@inproceedings{EBL-SPIE2009-Shoji,
  title     = {Verification of extraction repeating pattern efficiency from many actual device data},
  author    = {Masahiro Shoji and Tadao Inoue and Masaki Yamabe},
  booktitle = spie,
  volume    = {7275},
  year      = {2009},
}
@inproceedings{EBL-ASPDAC2012-Du,
  title     = {Character Design and Stamp Algorithms for Character Projection Electron-Beam Lithography},
  author    = {Peng Du and Wenbo Zhao and Shih-Hung Weng and Chung-Kuan Cheng and Ronald Graham},
  booktitle = aspdac,
  year      = {2012},
  pages     = {725--730},
}
@inproceedings{EBL-ASPDAC2013-Ikeno,
  title     = {High-throughput electron beam direct writing of {VIA} layers by character projection using character sets based on one-dimensional {VIA} arrays with area-efficient stencil design.},
  author    = {Ikeno, Rimon and Maruyama, Takashi and Iizuka, Tetsuya and Komatsu, Satoshi and Ikeda, Makoto and Asada, Kunihiro},
  booktitle = aspdac,
  pages     = {255--260},
  year      = {2013},
}
%}}}
% ==== Beam-to-Beam Stitching
%{{{
@inproceedings{EBL-SPIE2011-Takizawa,
  title     = {Position accuracy evaluation of multi-column e-beam exposure system},
  author    = {Masahiro Takizawa, Hideaki Komami, Masaki Kurokawa and Akio Yamada}, 
  booktitle = spie,
  year      = {2011},
}
@CONFERENCE{EBL-SPIE2000-Suzuki,
  title     = {Nikon {EB} stepper: its system concept and countermeasures for critical issues},
  author    = {Kazuaki Suzuki and Tomoharu Fujiwara and Kazunari Hada and Noriyuki Hirayanagi and Shintaro Kawata and Kenji Morita and Kazuya Okamoto and Teruaki Okino and Sumito Shimizu and Takehisa Yahiro}, 
  booktitle = spie,
  volume    = {3997},
  year      = {2000},
}
@inproceedings{EBL-SPIE2001-Tamura,
  title     = {Stitching accuracy measurement system for {EB} direct writing and electron beam projection lithography ({EPL})},
  author    = {Takao Tamura and Takahiro Ema and Hiroshi Nozue and Tomoya Sugahara and Akio Sugano and Jun Nitta},
  booktitle = spie,
  volume    = {4343},
  year      = {2001},
}
@article{EBL-JLT2001-Dougherty,
  title   = {Stitching-error reduction in gratings by shot-shifted electron-beam lithography}, 
  author  = {Dougherty, D.~J. and Muller, R.~E. and Maker, P.~D. and Forouhar, S.}, 
  journal = {Journal of Lightwave Technology}, 
  year    = {2001}, 
  month   = {oct}, 
  volume  = {19}, 
  number  = {10}, 
  pages   = {1527--1531}, 
}
@article{EBL-PTL1996-Albert, 
  title   = {Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography}, 
  author  = {J.~Albert and S.~Theriault and F.~Bilodeau and D.~C.~Johnson and K.~O.~Hill and P.~Sixt and M.~J.~Rooks}, 
  journal = {IEEE Photonics Technology Letters}, 
  year    = {1996}, 
  month   = {oct.}, 
  volume  = {8}, 
  number  = {10}, 
  pages   = {1334--1336}, 
}
%}}}
% ==== Sub-field Schedule
%{{{
@inproceedings{EBL-SPIE2003-Babin,
  title     = {Resist Heating Dependence on Subfield Scheduling in 50k{V} Electron Beam Maskmaking},
  author    = {Babin, Sergey and Kahng, Andrew B. and Mandoiu, Ion I. and Muddu, Swamy}, 
  booktitle = spie,
  volume    = {5130},
  year      = {2003},
}
@inproceedings{EBL-SPIE2003-Babin2,
  title     = {Subfield scheduling for throughput maximization in electron-beam photomask fabrication},
  author    = {Babin, Sergey and Kahng, Andrew B. and Mandoiu, Ion I. and Muddu, Swamy}, 
  booktitle = spie,
  volume    = {5037},
  year      = {2003},
}
@article{EBL-JVST2005-Babin, 
  title   = {Improving critical dimension accuracy and throughput by subfield scheduling in electron beam mask writing}, 
  author  = {Babin, Sergey and Kahng, Andrew B. and Mandoiu, Ion I. and Muddu, Swamy}, 
  journal = jvstb,
  year    = {2005}, 
  month   = {nov}, 
  volume  = {23}, 
  number  = {6}, 
  pages   = {3094--3100},
}
@inproceedings{EBL-ISPD2012-Fang,
  title     = {Graph-based subfield scheduling for electron-beam photomask fabrication},
  author    = {Fang, Shao-Yun and Chen, Wei-Yu and Chang, Yao-Wen},
  booktitle = ispd,
  year      = {2012},
  pages     = {9--16},
} 
@article{EBL-TCAD2013-Fang,
  title   = {Graph-based subfield scheduling for electron-beam photomask fabrication},
  author  = {Fang, S-Y and Chen, W-Y and Chang, Y-W},
  journal = tcad,
  volume  = {32},
  number  = {2},
  pages   = {189--201},
  year    = {2013},
}
%}}}


% ===================================================
%              Mask Fracturing 
% ===================================================
@inproceedings{MASK-SPIE2004-Kahng,
    title     = {Yield-and Cost-Driven Fracturing for Variable Shaped-Beam Mask Writing},
    author    = {Andrew B.~Kahng and Xu Xu and Alex Zelikovsky},
    booktitle = spie,
    volume    = {5567},
    year      = {2004},
}
@inproceedings{MASK-SPIE2006-Kahng,
    title     = {Fast Yield-Driven Fracture for Variable Shaped-Beam Mask Writing },
    author    = {Andrew B.~Kahng and Xu Xu and Alex Zelikovsky},
    booktitle = spie,
    volume    = {6283},
    year      = {2006},
}
@inproceedings{MASK-SPIE2008-Dillon,
    title     = {Case Study: The Impact of {VSB} Fracturing},
    author    = {Brian Dillon and Tim Norris},
    booktitle = spie,
    volume    = {7028},
    year      = {2008},
}
@inproceedings{MASK-SPIE2011-Ma,
    title     = {A Cost-Driven Fracture Heuristics to Minimize Sliver Length},
    author    = {Xu Ma and Shangliang Jiang and Avideh Zakhor},
    booktitle = spie,
    volume    = {7973},
    year      = {2011},
}
@inproceedings{MASK-SPIE2011-Jiang,
    title     = {A recursive cost-based approach to fracturing},
    author    = {Shangliang Jiang and Xu Ma and Avideh Zakhor},
    booktitle = spie,
    volume    = {7973},
    year      = {2011},
}
% ====== overlapping-rect fracturing
@inproceedings{MASK-SPIE2011-Chua,
    title     = {Optimization of mask shot count using {MB-MDP} and lithography simulation},
    author    = {Chua, Gek Soon and Wang, Wei Long and Choi, Byoung IL and Zou, Yi and Tabery, Cyrus and Bork, Ingo and Nguyen, Tam and Fujimura, Aki},
    booktitle = spie,
    volume    = {8166},
    year      = {2011},
}
@inproceedings{MASK-ICCAD2014-Chan,
    title     = {Benchmarking of Mask Fracturing Heuristics},
    author    = {Tuck Boon Chan and Puneet Gupta and Kwangsoo Han and Abde Ali Kagalwalla and Andrew B. Kahng and Emile Sahouria},
    booktitle = iccad,
    pages     = {246--253},
    year      = {2014},
}
@article{MASK-TCAD2017-Chan,
    title   = {Benchmarking of Mask Fracturing Heuristics},
    author  = {T.~{Chan} and P.~{Gupta} and K.~{Han} and A.~A.~{Kagalwalla} and A.~B.~{Kahng}},
    journal = tcad,
    volume  = {36},
    pages   = {170--183},
    year    = {2017},
}
% ====== curvilinear fracturing
@inproceedings{MASK-SPIE2019-Ryan,
    title     = {How curvilinear mask patterning will enhance the {EUV} process window: a study using rigorous wafer+ mask dual simulation},
    author    = {Pearman, Ryan and Ungar, Jeff and Shirali, Nagesh and Shendre, Abishek and Niewczas, Mariusz and Pang, Leo and Fujimura, Aki},
    booktitle = spie,
    volume    = {11178},
    year      ={2019},
}
@inproceedings{MASK-SPIE2019-Ryan2,
    title     = {Enhancing {ILT} process window using curvilinear mask patterning: dual mask-wafer simulation},
    author    = {Pearman, Ryan and Ungar, P Jeffrey and Shirali, Nagesh and Shendre, Abhishek and Niewczas, Mariusz and Pang, Linyong and Fujimura, Aki},
    booktitle = spie,
    volume    = {10961},
    year      = {2019},
}
% ====== L-Shape Fracturing
%{{{
@inproceedings{MASK-SPIE2010-Sahouria,
  title     = {Generalization of shot definition for variable shaped e-beam machines for write time reduction},
  author    = {Emile Sahouria and Amanda Bowhill},
  booktitle = spie,
  volume    = {7823},
  year      = {2010},
  abstract  = {propose the first L-Shape shot},
}
@inproceedings{MASK-SPIE2011-Elayat,
  title     = {Assessment and comparison of different approaches for mask write time reduction},
  author    = {A.~Elayat and T.~Lin and E.~Sahouria and S.~F.~Schulze},
  booktitle = spie,
  volume    = {8166},
  year      = {2011},
}
@inproceedings{MASK-ASPDAC2013-Yu,
  title     = {{L-Shape} Based Layout Fracturing for {E-Beam} Lithography},
  author    = {Bei Yu and Jhih-Rong Gao and David Z.~Pan},
  booktitle = aspdac,
  pages     = {249--254},
  year      = {2013}
}
@article{JOG1983-Rourke,
  title    = {An alternate proof of the rectilinear art gallery theorem},
  author   = {O'Rourke, Joseph},
  journal  = {Journal of Geometry},
  pages    = {118--130},
  volume   = {21},
  issue    = {1},
  year     = {1983},
  abstract = {LShape fracturing in General Computer Science}
}
%}}}


% ===================================================
%                   DSA
% ===================================================
% == DSA summary
%{{{
@article{DSA-SCIENCE2008-Bita,
    title     = {Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates},
    author    = {Ion Bita and Joel K.~W.~Yang and Yeon Sik Jung and Caroline A.~Ross and Edwin L.~Thomas and Karl K.~Berggren},
    journal   = {Science},
    volume    = {321},
    number    = {5891},
    pages     = {939--943},
    year      = {2008},
}
@inproceedings{DSA-IEDM2010-Chang,
    title     = {Experimental demonstration of aperiodic patterns of directed self-assembly by block copolymer lithography for random logic circuit layout},
    author    = {Chang, Li-Wen and Xinyu Bao and Bencher Chris and H.-S.~Philip Wong},
    booktitle = iedm,
    pages     = {33.2.1--33.2.4},
    year      = {2010},
}
@inproceedings{DSA-SPIE2012-Seino,
    title     = {Contact hole shrink process using directed self-assembly},
    author    = {Seino, Yuriko and Yonemitsu, Hiroki and Sato, Hironobu and Kanno, Masahiro and Kato, Hikazu and Kobayashi, Katsutoshi and Kawanishi, Ayako and Azuma, Tsukasa and Muramatsu, Makoto and Nagahara, Seiji and others},
    booktitle = spie,
    volume    = 8323,
    year      = {2012},
}
@inproceedings{DSA-SPIE2012-Somervell,
    title     = {Comparison of directed self-assembly integrations},
    author    = {Mark Somervell and Roel Gronheid and Joshua Hooge and Kathleen Nafus and Paulina Rincon Delgadillo and Chris Thode and Todd Younkin and Koichi Matsunaga and Ben Rathsack and Steven Scheer and Paul Nealey},
    booktitle = spie,
    volume    = {8325},
    year      = {2012},
}
@inproceedings{DSA-SPIE2012-Yi,
    title     = {Contact-hole patterning for random logic circuit using block copolymer directed self-assembly},
    author    = {He Yi and Xin-Yu Bao and Jie Zhang and Richard Tiberio and James Conway and Li-Wen Chang and Subhasish Mitra and H.-S.~Philip Wong},
    booktitle = spie,
    volume    = {8323},
    year      = {2012},
}
@inproceedings{DSA-SPIE2012-Wong,
    title     = {Block copolymer directed self-assembly enables sublithographic patterning for device fabrication},
    author    = {H.-S.~Philip Wong and Chris Bencher and He Yi and Xin-Yu Bao and Li-Wen Chang},
    booktitle = spie,
    volume    = {8323},
    year      = {2012},
}
@article{DSA-ADV2012-Yi,
    title     = {Flexible control of block copolymer directed self-assembly using small, topographical templates: potential lithography solution for integrated circuit contact hole patterning},
    author    = {Yi He and Xin-Yu Bao and Jie Zhang and Christopher Bencher and Li-Wen Zhang and Xiangyu Chen and Richard Tiberio and James Conway and Huixiong Dai and Yongmei Chen and Subhasish Mitra and H.-S.~Philip Wong},
    journal   = advmat,
    volume    = {24},
    number    = {23},
    year      = {2012},
}
@article{DSA-MATERIAL2013-Jeong,
    title     = {Directed self-assembly of block copolymer for next generation nanolithography},
    author    = {Seong-Jun Jeong and Ju Young Kim and Bong Hoon Kim and Hyoung-Seok Moon and Sang Ouk Kim},
    journal   = {Materials Today},
    volume    = {16},
    number    = {12},
    pages     = {468--476},
    year      = {2013},
}
@article{DSA-JM3-2013-Seino,
    title     = {Contact hole shrink process using graphoepitaxial directed self-assembly lithography},
    author    = {Yuriko Seino and Hiroki Yonemitsu and Hironobu Sato and Masahiro Kanno and Hirokazu Kato and Katsutoshi Kobayashi and Ayako Kawanishi and Tsukasa Azuma and Makoto Muramatsu and Seiji Nagahara and Takahiro Kitano and Takayuki Toshima},
    journal   = jm3,
    volume    = {12},
    number    = {3},
    year      = {2013},
}
@article{DSA-MACRO2013-Luo,
    title   = {Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication},
    author  = {Ming Luo and Thomas H.Epps III},
    journal = {Macromolecules},
    volume  = {46},
    number  = {19},
    pages   = {7567--7579},
    year    = {2013},
}
@article{DSA-JM3-2014-Wuister,
    title     = {Fundamental study of placement errors in directed self-assembly},
    author    = {Sander F.~Wuister and Davide Ambesi and Tamara S.~Druzhinina and Emiel Peeters and Jo Finders and Joanne K.~Wolterink and Johannes G.~Fraaije},
    journal   = jm3,
    volume    = {13},
    number    = {3},
    year      = {2014},
}
@inproceedings{DSA-SPIE2014-Latypov,
    title     = {Simulations of spatial {DSA} morphology, {DSA}-aware assist features and block copolymer-homopolymer blends},
    author    = {Azat Latypov and Tamer H. Coskun and Grant Garner and Moshe Preil and Gerard Schmid and Ji Xu and Yi Zou},
    booktitle = spie,
    volume    = {9049},
    year      = {2014},
}
@inproceedings{DSA-SPIE2014-Wuister,
    title     = {Influence of litho patterning on {DSA} placement errors},
    author    = {Sander Wuister and Tamara Druzhinina and Davide Ambesi and Bart Laenens and Linda He Yi and Jo Finders},
    booktitle = spie,
    volume    = {9049},
    year      = {2014},
}
@inproceedings{DSA-SPIE2015-Graves,
    title     = {{DSA} graphoepitaxy calibration for contact hole multiplication},
    author    = {Trey Graves and Alessandro Vaglio Pret and Stewart Robertson and Mark Smith and Jan Doise and Joost Bekaert and Roel Gronheid},
    booktitle = spie,
    volume    = {9425},
    year      = {2015},
}
@inproceedings{DSA-ISPD2015-Wong,
    title     = {Physical Layout Design of Directed Self-Assembly Guiding Alphabet for {IC} Contact Hole/via Patterning},
    author    = {H.-S.~Philip Wong and He Yi and Maryann Tung and Kye Okabe},
    booktitle = ispd,
    year      = {2015},
    pages     = {65--66},
}
%}}}
% == GTA + DSA 
%{{{
@inproceedings{DSA-ICCAD2013-Du,
    title     = {Block Copolymer Directed Self-Assembly ({DSA}) Aware Contact Layer Optimization for 10 nm {1D} Standard Cell Library},
    author    = {Yuelin Du and Daifeng Guo and Martin D.~F.~Wong and He Yi and H.-S.~Philip Wong and Hongbo Zhang and Qiang Ma},
    booktitle = iccad,
    pages     = {186--193},
    year      = {2013},
}
@inproceedings{DSA-SPIE2013-Xiao,
    title     = {{DSA} Template Mask Determination and Cut Redistribution for Advanced {1D} Gridded Design},
    author    = {Zigang Xiao and Yuelin Du and Martin D.~F.~Wong and Hongbo Zhang},
    booktitle = spie,
    volume    = {8880},
    year      = {2013},
}
@inproceedings{DSA-SPIE2014-Ma,
    title     = {Challenges and opportunities in applying grapho-epitaxy {DSA} lithography to metal cut and contact/via applications},
    author    = {Yuansheng Ma and J. Andres Torres and Germain Fenger and Yuri Granik and Julien Ryckaert and Geert Vanderberghe and Joost Bekaert and James Word},
    booktitle = spie,
    volume    = {9231},
    year      = {2014},
}
@inproceedings{DSA-SPIE2015-Badr,
    title     = {Incorporating {DSA} in multipatterning Semiconductor manufacturing technologies},
    author    = {Yasmine Badr and Juan Andres Torres and Yuansheng Ma and Joydeep Mitra and Puneet Gupta},
    booktitle = spie,
    volume    = {9427},
    year      = {2015},
}
@inproceedings{DSA-DAC2015-Badr,
    title     = {Mask Assignment and Synthesis of {DSA-MP} Hybrid Lithography for Sub-7nm Contacts/Vias},
    author    = {Badr, Yasmine and Torres, Andres and Gupta, Puneet},
    booktitle = dac,
    pages     = {70:1--70:6},
    year      = {2015},
}
@inproceedings{DSA-GLSVLSI2015-Ou,
    title     = {Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design},
    author    = {Jiaojiao Ou and Bei Yu and Jhih-Rong Gao and David Z.~Pan and Moshe Preil and Azat Latypov},
    booktitle = glsvlsi,
    year      = {2015},
    pages     = {83--86},
}
@article{DSA-JM3-2015-Ou,
    title     = {Directed self-assembly cut mask assignment for unidirectional design},
    author    = {Jiaojiao Ou and Bei Yu and Jhih-Rong Gao and David Z.~Pan},
    journal   = jm3,
    volume    = {14},
    number    = {3},
    year      = {2015},
}
@inproceedings{DSA-SPIE2015-Ma,
    title     = {Directed self-assembly ({DSA}) grapho-epitaxy template generation with immersion lithography},
    author    = {Yuansheng Ma and Junjiang Lei and Juan Andres Torres and Le Hong and James Word and Germain Fenger and Alexander Tritchkov and George Lippincott and Rachit Gupta and Neal Lafferty and Yuan He and Joost Bekaert and Geert Vanderberghe},
    booktitle = spie,
    volume    = {9423},
    year      = {2015},
}
@inproceedings{DSA-ASPDAC2016-Lin,
    title     = {Cut redistribution with directed self-assembly templates for advanced {1-D} gridded layouts},
    author    = {Lin, Zhi-Wen and Chang, Yao-Wen},
    booktitle = aspdac,
    pages     = {89--94},
    year      = {2016},
}
@inproceedings{DSA-ASPDAC2016-Kuang,
    title     = {Simultaneous template optimization and mask assignment for {DSA} with multiple patterning},
    author    = {Kuang, Jian and Ye, Junjie and Evangeline F.~Y.~Young},
    booktitle = aspdac,
    pages     = {75--82},
    year      = {2016},
}
@inproceedings{DSA-SPIE2016-Ma,
    title     = {Directed Self Assembly ({DSA}) compliant flow with immersion lithography: from material to design and patterning},
    author    = {Ma, Yuansheng and Wang, Yan and Word, James and Lei, Junjiang and Mitra, Joydeep and Torres, J.~Andres and Hong, Le and Fenger, Germain and Khaira, Daman and Preil, Moshe and others},
    booktitle = spie,
    volume    = {9777},
    year      = {2016},
}
@inproceedings{DSA-SPIE2016-Karageorgos,
    title    = {Design strategy for integrating {DSA} via patterning in sub-7nm interconnects},
    author   = {Ioannis Karageorgos and Julien Ryckaert and Maryann C.~Tung and H.~S.~Philip Wong and Roel Gronheid and Joost Bekaert and Evangelos Karageorgos and Kris Croes and Geert Vandenberghe and Michele Stucchi and Wim Dehaene},
    booktitle= spie,
    volume   = 9781,
    year     = {2016},
}
@inproceedings{DSA-ISPD2016-Lin,
    title     = {Double-Patterrning Aware {DSA} Template Guided Cut Redistribution for Advanced {1-D} Gridded Designs},
    author    = {Lin, Zhi-Wen and Chang, Yao-Wen},
    booktitle = ispd,
    pages     = {47--54},
    year      = {2016},
}
@article{DSA-TVLSI2018-Li,
    title={Graph-Based Redundant Via Insertion and Guiding Template Assignment for {DSA-MP}},
    author={Xingquan Li and Bei Yu and Jiaojiao Ou and Jianli Chen and David Z.~Pan and Wenxing Zhu},
    journal=tvlsi,
    year={2018},
    pages={1--14},
}
%}}}
% == RVI + DSA
%{{{
@inproceedings{DSA-ICCAD2015-Fang,
    title     = {Simultaneous Guiding Template Optimization and Redundant Via Insertion for Directed Self-Assembly},
    author    = {Shao-Yun Fang and Yun-Xiang Hong and Yi-Zhen Lu},
    booktitle = iccad,
    pages     = {410--417},
    year      = {2015},
}
@inproceedings{DSA-ISPD2016-Ou,
    title     = {Concurrent Guiding Template Assignment and Redundant Via Insertion for {DSA-MP} Hybrid Lithography},
    author    = {Jiaojiao Ou and Bei Yu and David Z.~Pan},
    booktitle = ispd,
    pages     = {39--46},
    year      = {2016},
}
@inproceedings{DSA-DATE2016-Chung,
    title     = {Redundant via insertion in directed self-assembly lithography},
    author    = {Chung, Woohyun and Shim, Seongbo and Shin, Youngsoo},
    booktitle = date,
    pages     = {55--60},
    year      = {2016},
}
%}}}
% == DSA verification
%{{{
@inproceedings{DSA-DAC2014-Xiao,
    title     = {Directed Self-Assembly ({DSA}) Template Pattern Verification},
    author    = {Xiao, Zigang and Du, Yuelin and Tian, Haitong and Martin D.~F.~Wong and Yi, He and Wong, H.-S.~Philip and Zhang, Hongbo},
    booktitle = dac,
    year      = {2014},
    pages     = {55:1--55:6},
}
@inproceedings{DSA-ASPDAC2015-Xiao,
    title     = {Contact Pitch and Location Prediction for Directed Self-Assembly Template Verification},
    author    = {Zigang Xiao and Yuelin Du and Martin D.~F.~Wong and He Yi and H.-S.~Philip Wong and Hongbo Zhang},
    booktitle = aspdac,
    year      = {2015},
    pages     = {644--651},
}
%}}}


% ===================================================
%                   EUV
% ===================================================
% ==== EUV summary
%{{{
@article{EUV-JM3-2009-Levinson,
    title   = {Extreme ultraviolet lithography’s path to manufacturing},
    author  = {Levinson, Harry J.},
    journal = jm3,
    volume  = {8},
    number  = {4},
    pages   = {041501--041501},
    year    = {2009},
}
@book{EUV-B2009-Bakshi,
    title     = {{EUV Lithography}},
    author    = {Bakshi, Vivek},
    volume    = {178},
    year      = {2009},
    publisher = {SPIE Press},
}
@article{EUV-NPhoton2010-Wagner,
    title   = {{EUV} lithography: Lithography gets extreme},
    author  = {Wagner, Christian and Harned, Noreen},
    journal = nphoton,
    volume  = {4},
    number  = {1},
    pages   = {24--26},
    year    = {2010},
}
@inproceedings{EUV-SPIE2015-van,
    title     = {{EUV} lithography scanner for sub 8 nm resolution},
    author    = {van Schoot, Jan and van Ingen Schenau, Koen and Valentin, Chris and Migura, Sascha},
    booktitle = spie,
    volume    = {9422},
    year      = {2015},
}
@inproceedings{EUV-SPIE2018-Levinson,
    title     = {Current challenges and opportunities for {EUV} lithography},
    author    = {Levinson, Harry J and Brunner, Timothy A},
    booktitle = spie,
    volume    = {10809},
    year      = {2018},
}
%}}}
% ==== EUV models
%{{{
@inproceedings{EUV-SPIE2005-Schellenberg,
    title     = {Layout Compensation for {EUV} Flare},
    author    = {F.~Schellenberg and J.~Word and O.~Toublan},
    booktitle = spie,
    volume    = {5751},
    year      = {2005},
}
@inproceedings{EUV-SPIE2005-Lee,
    title     = {Characterization of Flare on {Intel°Øs EUV MET}},
    author    = {S.~Lee and M.~Chandhok and J.~Roberts and B.~Rice},
    booktitle = spie,
    volume    = {5751},
    year      = {2005},
}
@inproceedings{EUV-SPIE2007-Evanschitzky,
    title     = {{Fast near field simulation of optical and EUV masks using the waveguide method}},
    author    = {P.~Evanschitzky and A.~Erdmann},
    booktitle = spie,
    volume    = {6533},
    year      = {2007},
}
@inproceedings{EUV-SPIE2009-Mizuno,
    title     = {Flare evaluation of {ASML} alpha demo tool},
    author    = {H.~Mizuno and G.~McIntyre and C.~Koay and M.~Burkhardt and B.~Fontaine and Obert Wood},
    booktitle = spie,
    volume    = {7271},
    year      = 2009,
}
@inproceedings{EUV-SPIE2009-Domnenko,
    title     = {Analysis of {EUVL} mask effects under partially coherent illumination},
    author    = {V.~Domnenko and T.~Schmoeller and T.~Klimpel},
    booktitle = spie,
    volume    = {7271},
    year      = 2009,
}
@inproceedings{EUV-SPIE2009-Jang,
    title     = {Requirements and results of a full-field {EUV OPC} flow},
    author    = {S.~Jang and L.~Zavyalova and B.~Ward and K.~Lucas},
    booktitle = spie,
    volume    = {7271},
    year      = 2009,
}
@inproceedings{EUV-SPIE2009-Wood,
    title     = {Integration of {EUV} lithography in the fabrication of 22-nm node devices},
    Author    = {Obert Wood and Chiew-Seng Koay and Karen Petrillo and Hiroyuki Mizuno and Sudhar Raghunathan},
    booktitle = spie,
    volume    = {7271},
    year      = 2009,
}
@inproceedings{EUV-SPIE2009-Moon,
    title     = {Evaluation of shadowing and flare effect for {EUV} tool},
    author    = {J. Moon and C. Kim and B. Nam and B. Nam and Y. Hyun and S. Kim and C. Lim and Y. Kim and M. Kim and Y. Choi and C. Kim and Donggyu Yim},
    booktitle = spie,
    volume    = {7271},
    year      = 2009,
}
@inproceedings{EUV-SPIE2010-Chan,
    title     = {{EUV} mask defect inspection and defect review strategies for euv pilot line and high volume manufacturing},
    author    = {Y. D. Chan and A. Rastegar and H. Yun and E. S. Putna and S. Wurm},
    booktitle = spie,
    volume    = {7636},
    year      = 2010,
}
@inproceedings{EUV-SPIE2010-Arisawa,
    title     = {{EUV} flare correction for the half-pitch 22nm node},
    author    = {Yukiyasu Arisawa and Hajime Aoyama and Taiga Uno and Toshihiko Tanaka},
    booktitle = spie,
    volume    = {7636},
    year      = {2010},
}
@inproceedings{EUV-SPIE2011-Pang,
    title     = {Compensation for {EUV} multilayer defects within arbitrary layouts by absorber pattern modification},
    author    = {L. L. Pang and C. Clifford and P. Hu and D. Peng and Y. Li and D. Chen and M. Satake and V. Tolani and L. He},
    Booktitle = spie,
    year      = {2011},
    volume    = {7969},
}
@inproceedings{EUV-SPIE2010-Clifford,
    author    = {C. H. Clifford and T. T. Chan and A. R. Neureuther},
    title     = {Compensation methods for buried defects in extreme ultraviolet lithography masks},
    booktitle = spie,
    volume    = {7636},
    year      = {2010},
}
@inproceedings{EUV-SPIE2019-Domnenko,
    title     = {{EUV} computational lithography using accelerated topographic mask simulation},
    author    = {Domnenko, Vitaly and K{\"u}chler, Bernd and Hoppe, Wolfgang and Preuninger, J{\"u}rgen and Klostermann, Ulrich and Demmerle, Wolfgang and Bohn, Martin and Kr{\"u}ger, Dietmar and Kim, Ryoung Ryoung Han and Tan, Ling Ee},
    booktitle = SPIE,
    year      = {2019},
}
%}}}
% ==== EUV pattern relocation
%{{{
@inproceedings{EUV-ASPDAC2012-Zhang,
    title     = {Efficient Pattern Relocation for {EUV} Blank Defect Mitigation},
    author    = {Hongbo Zhang and Yuelin Du and Martin D.~F.~Wong and Rasit O.~Tapalaglu},
    booktitle = aspdac,
    pages     = {719--724},
    year      = {2012},
}
@inproceedings{EUV-ICCAD2012-Zhang,
    title     = {Layout small-angle rotation and shift for {EUV} defect mitigation},
    author    = {Zhang, Hongbo and Du, Yuelin and Martin D.~F.~Wong and Deng, Yunfei and Mangat, Pawitter},
    booktitle = iccad,
    pages     = {43--49},
    year      = {2012},
}
@inproceedings{EUV-ASPDAC2013-Du,
    title     = {Linear time algorithm to find all relocation positions for {EUV} defect mitigation.},
    author    = {Du, Yuelin and Zhang, Hongbo and Ma, Qiang and Martin D.~F.~Wong},
    booktitle = aspdac,
    pages     = {261--266},
    year      = {2013},
}
%}}}
% ==== EUV aware physical design
%{{{
@inproceedings{EUV-SPIE2011-Kagalwalla,
    title     = {Defect-aware Reticle Floorplanning for {EUV} Masks},
    author    = {Abde Ali Kagalwalla and Puneet Gupta and Duck-Hyung Hur and Chul-Hong Park},
    booktitle = spie,
    volume    = {7479},
    year      = {2011},
}
@inproceedings{EUV-SPIE2012-Du,
    title     = {Defect-aware reticle floorplanning in {EUVL} considering side-to-side wafer dicing},
    author    = {Yuelin Du and Hongbo Zhang and Martin D.~F.~Wong},
    booktitle = spie,
    volume    = {7974},
    year      = {2012},
}
@inproceedings{EUV-DAC2012-Fang,
    title     = {Simultaneous flare level and flare variation minimization with dummification in {EUVL}},
    author    = {Fang, Shao-Yun and Chang, Yao-Wen},
    booktitle = dac,
    year      = {2012},
    pages     = {1179--1184},
}
@article{EUV-TSM2013-Kagalwalla,
    title     = {Design-aware defect-avoidance floorplanning of {EUV} masks},
    author    = {Kagalwalla, Abde Ali and Gupta, Puneet},
    journal   = tsm,
    volume    = {26},
    number    = {1},
    pages     = {111--124},
    year      = {2013},
    publisher = {IEEE},
}
@inproceedings{EUV-SPIE2010-Burns,
    title     = {{EUV} mask defect mitigation through pattern placement},
    author    = {John Burns and Mansoor Abbas},
    booktitle = spie,
    volume    = {7823},
    year      = {2010},
}
%}}}


% ===================================================
%               model DFM
% ===================================================
% ==== litho simulation
@inproceedings{DFM-SPIE2017-Tabery,
    title     = {In-design and signoff lithography physical analysis for 7/5nm},
    author    = {Tabery, Cyrus and Zou, Yi and Arnoux, Vincent and Raghavan, Praveen and Kim, Ryoung-han and C{\^o}t{\'e}, Michel and Mattii, Luca and Lai, Ya-Chieh and Hurat, Philippe},
    booktitle = spie-al,
    volume    = {10147},
    year      = {2017},
}
@inproceedings{DFM-ISPD2018-Lin,
    title     = {Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning},
    author    = {Lin, Yibo and Watanabe, Yuki and Kimura, Taiki and Matsunawa, Tetsuaki and Nojima, Shigeki and Li, Meng and Pan, David Z},
    booktitle = ispd,
    pages     = {82--89},
    year      = {2018},
}
@article{DFM-TCAD2019-Lin,
    title     = {Data efficient lithography modeling with transfer learning and active data selection},
    author    = {Lin, Yibo and Li, Meng and Watanabe, Yuki and Kimura, Taiki and Matsunawa, Tetsuaki and Nojima, Shigeki and Pan, David Z},
    journal   = tcad,
    year      = {2019},
    publisher = {IEEE}
}
@inproceedings{DFM-DAC2019-Ye,
    title     = {{LithoGAN}: End-to-End Lithography Modeling with Generative Adversarial Networks},
    author    = {Ye, Wei and Alawieh, Mohamed Baker and Lin, Yibo and Pan, David Z.},
    booktitle = dac,
    year      = {2019},
    pages     = {107:1--107:6},
}
% ==== LER
%{{{
@inproceedings{LER-SPIE2009-Naulleau,
    title     = {Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specifications},
    author    = {P. Naulleau and S. George},
    booktitle = spie,
    volume    = {7379},
    year      = 2009,
}
@inproceedings{LER-IEPBN2009-Ruzic,
    title     = {Line Edge Roughness Reduction Studies Employing Grazing Incidence Ion Beam},
    author    = {D. Ruzic and C. Struck and R. Raju and M. Neumann and R. Flauta and R. Bristol},
    booktitle = {Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)},
    year      = 2009,
}
@inproceedings{LER-DAC2011-Ban,
    title     = {Layout Aware Line-Edge Roughness Modeling and Poly Optimization for Leakage Minimization},
    author    = {Yongchan Ban and Jae-Seok Yang},
    booktitle = dac,
    year      = {2011},
    pages     = {447--452},
}
%}}}
% ==== MEEF
%{{{
@article{MEEF-TSM2000-Wong,
    title     = {The mask error factor in optical lithography},
    author    = {Wong, Alfred K. and Ferguson, Richard A. and Mansfield, Scott M.},
    journal   = tsm,
    volume    = {13},
    number    = {2},
    pages     = {235--242},
    year      = {2000},
    publisher = {IEEE},
}
@inproceedings{MEEF-Photomask2002-Granik,
    title     = {{MEEF} as a Matrix},
    author    = {Granik, Yuri and Cobb, Nicolas B.},
    booktitle = {Photomask},
    pages     = {980--991},
    year      = {2002},
}
%}}}


% ===================================================
%                  Nanoimprint 
% ===================================================
@inproceedings{NIL-SPIE2011-Higashiki,
    title     = {Nanoimprint lithography for semiconductor devices and future patterning innovation},
    author    = {Higashiki, Tatsuhiko and Nakasugi, Tetsuro and Yoneda, Ikuo},
    booktitle = spie,
    volume    = {7970},
    year      = {2011},
}